A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole

H.K. Kuiken

    Research output: Contribution to journalArticleAcademicpeer-review

    19 Citations (Scopus)
    Original languageUndefined
    Pages (from-to)75-90
    JournalJournal of engineering mathematics
    Volume45
    Issue number1
    DOIs
    Publication statusPublished - 2003

    Keywords

    • METIS-209106

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