A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole

H.K. Kuiken

Research output: Contribution to journalArticleAcademicpeer-review

19 Citations (Scopus)
Original languageUndefined
Pages (from-to)75-90
JournalJournal of engineering mathematics
Volume45
Issue number1
DOIs
Publication statusPublished - 2003

Keywords

  • METIS-209106

Cite this

@article{725e711e04714d698ecdf85f10e1353b,
title = "A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole",
keywords = "METIS-209106",
author = "H.K. Kuiken",
year = "2003",
doi = "10.1023/A:102208001",
language = "Undefined",
volume = "45",
pages = "75--90",
journal = "Journal of engineering mathematics",
issn = "0022-0833",
publisher = "Springer",
number = "1",

}

A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole. / Kuiken, H.K.

In: Journal of engineering mathematics, Vol. 45, No. 1, 2003, p. 75-90.

Research output: Contribution to journalArticleAcademicpeer-review

TY - JOUR

T1 - A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole

AU - Kuiken, H.K.

PY - 2003

Y1 - 2003

KW - METIS-209106

U2 - 10.1023/A:102208001

DO - 10.1023/A:102208001

M3 - Article

VL - 45

SP - 75

EP - 90

JO - Journal of engineering mathematics

JF - Journal of engineering mathematics

SN - 0022-0833

IS - 1

ER -