A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole

H.K. Kuiken

    Research output: Contribution to journalArticleAcademicpeer-review

    19 Citations (Scopus)
    Original languageUndefined
    Pages (from-to)75-90
    JournalJournal of engineering mathematics
    Volume45
    Issue number1
    DOIs
    Publication statusPublished - 2003

    Keywords

    • METIS-209106

    Cite this

    @article{725e711e04714d698ecdf85f10e1353b,
    title = "A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole",
    keywords = "METIS-209106",
    author = "H.K. Kuiken",
    year = "2003",
    doi = "10.1023/A:102208001",
    language = "Undefined",
    volume = "45",
    pages = "75--90",
    journal = "Journal of engineering mathematics",
    issn = "0022-0833",
    publisher = "Springer",
    number = "1",

    }

    A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole. / Kuiken, H.K.

    In: Journal of engineering mathematics, Vol. 45, No. 1, 2003, p. 75-90.

    Research output: Contribution to journalArticleAcademicpeer-review

    TY - JOUR

    T1 - A mathematical model for wet-chemical diffusion-controlled mask etching through a circular hole

    AU - Kuiken, H.K.

    PY - 2003

    Y1 - 2003

    KW - METIS-209106

    U2 - 10.1023/A:102208001

    DO - 10.1023/A:102208001

    M3 - Article

    VL - 45

    SP - 75

    EP - 90

    JO - Journal of engineering mathematics

    JF - Journal of engineering mathematics

    SN - 0022-0833

    IS - 1

    ER -