A new technique for accurately defined deposition of catalyst thin films in deep flow channels of high temperature gas microreactors

Roald M. Tiggelaar, Johan W. Berenschot, R.E. Oosterbroek, R.E. van Male, M.H.J.M. de Croon, J.C. Schouten, Albert van den Berg, Michael Curt Elwenspoek

    Research output: Contribution to conferencePoster

    Original languageUndefined
    Pages-
    Publication statusPublished - 8 Jun 2003
    Event12th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2003 - Boston, United States
    Duration: 8 Jun 200312 Jun 2003
    Conference number: 12

    Conference

    Conference12th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2003
    Abbreviated titleTRANSDUCERS 2003
    CountryUnited States
    CityBoston
    Period8/06/0312/06/03

    Keywords

    • METIS-215188

    Cite this

    Tiggelaar, R. M., Berenschot, J. W., Oosterbroek, R. E., van Male, R. E., de Croon, M. H. J. M., Schouten, J. C., ... Elwenspoek, M. C. (2003). A new technique for accurately defined deposition of catalyst thin films in deep flow channels of high temperature gas microreactors. -. Poster session presented at 12th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2003, Boston, United States.