A new technique for accurately defined deposition of catalyst thin films in deep flow channels of high-temperature gas microreactors

Roald M. Tiggelaar, Johan W. Berenschot, R.E. Oosterbroek, P. van Male, M.H.J.M. de Croon, J.C. Schouten, Albert van den Berg

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    4 Citations (Scopus)
    144 Downloads (Pure)

    Abstract

    By using microreactors fabricated with silicon microtechnology, heterogeneous catalyzed gas-phase reactions can be studied which are difficult to control because of their exothermic nature, are explosive or use toxic/hazardous gases. In this type of microreactors, catalytic materials like rhodium or platinum are deposited on a thin membrane in deep trenches. Conventional techniques, like lift-off lithography, cannot be used in deep trenches and deposition through flat shadow masks does not yield well-defined regions of catalyst. For well-controlled deposition of a catalytic thin film on a membrane located in a deep trench, a technique is developed using sputter deposition with a 3-dimensionally shaped 'self-aligning' shadow mask.
    Original languageUndefined
    Title of host publicationProceedings of Transducers 2003 Conference
    Place of PublicationBoston, USA
    PublisherIEEE
    Pages746-749
    ISBN (Print)0-7803-7731-1
    Publication statusPublished - 8 Jun 2003
    Event12th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2003 - Boston, United States
    Duration: 8 Jun 200312 Jun 2003
    Conference number: 12

    Publication series

    Name
    PublisherIEEE
    Volume1

    Conference

    Conference12th International Conference on Solid-State Sensors, Actuators and Microsystems, TRANSDUCERS 2003
    Abbreviated titleTRANSDUCERS 2003
    CountryUnited States
    CityBoston
    Period8/06/0312/06/03

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