A new technology for micromachining of silicon: dopant selective HF anodic etching for the realization of low-doped monocrystalline silicon structurs

C.J.M. Eijkel, J. Branebjerg, M. Elwenspoek, F.C.M. van de Pol

    Research output: Contribution to conferencePosterOther research output

    Original languageEnglish
    Publication statusPublished - 30 Jan 1991
    EventIEEE Workshop on Micro Electro Mechanical Systems, MEMS 1991 - Nara, Japan
    Duration: 30 Jan 19912 Feb 1991

    Conference

    ConferenceIEEE Workshop on Micro Electro Mechanical Systems, MEMS 1991
    Abbreviated titleMEMS
    CountryJapan
    CityNara
    Period30/01/912/02/91

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