A new technology for micromachining of silicon: dopant selective HF anodic etching for the realization of low-doped monocrystalline silicon structures

C.J.M. Eijkel, M. Elwenspoek, F.C.M. van de Pol

    Research output: Contribution to conferencePosterOther research output

    Original languageEnglish
    Publication statusPublished - 26 Nov 1990
    Event2nd MicroMechanics Europe Workshop, MME 1990 - Berlin, Germany
    Duration: 26 Nov 199027 Nov 1990
    Conference number: 2

    Workshop

    Workshop2nd MicroMechanics Europe Workshop, MME 1990
    Abbreviated titleMME
    Country/TerritoryGermany
    CityBerlin
    Period26/11/9027/11/90

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