A new technology for micromachining of silicon: dopant selective HF anodic etching for the realization of low-doped monocrystalline silicon structures

C.J.M. Eijkel, M. Elwenspoek, F.C.M. van de Pol

    Research output: Contribution to conferencePoster

    Original languageEnglish
    Publication statusPublished - 26 Nov 1990
    Event1st MicroMechanics Europe Workshop, MME 1990 - Berlin, Germany
    Duration: 26 Nov 199027 Nov 1990
    Conference number: 1

    Conference

    Conference1st MicroMechanics Europe Workshop, MME 1990
    Abbreviated titleMME
    CountryGermany
    CityBerlin
    Period26/11/9027/11/90

    Cite this

    Eijkel, C. J. M., Elwenspoek, M., & van de Pol, F. C. M. (1990). A new technology for micromachining of silicon: dopant selective HF anodic etching for the realization of low-doped monocrystalline silicon structures. Poster session presented at 1st MicroMechanics Europe Workshop, MME 1990, Berlin, Germany.