A new technology for micromachining of silicon: dopant selective HF anodic etching for the realization of low-doped monocrystalline silicon structure

C.J.M. Eijkel; J. Branebjerg; M. Elwenspoek; F.C.M. van de Pol

A new technology for micromachining of silicon: dopant selective HF anodic etching for the realization of low-doped monocrystalline silicon structure

C.J.M. Eijkel
, J. Branebjerg
, M. Elwenspoek
, F.C.M. van de Pol

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Original language	English
Title of host publication	Micromechanics Europe 1990
Subtitle of host publication	papers from the European Workshop on Micromechanics (MME '90)
Place of Publication	Berlin
Pages	175-179
Number of pages	5
Publication status	Published - 26 Nov 1990
Event	2nd MicroMechanics Europe Workshop, MME 1990 - Berlin, Germany Duration: 26 Nov 1990 → 27 Nov 1990 Conference number: 2

Workshop

Workshop	2nd MicroMechanics Europe Workshop, MME 1990
Abbreviated title	MME
Country/Territory	Germany
City	Berlin
Period	26/11/90 → 27/11/90

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Cite this

@inproceedings{cc8fb2be70cf4717b2b8c6a26ebcc1bb,

title = "A new technology for micromachining of silicon: dopant selective HF anodic etching for the realization of low-doped monocrystalline silicon structure",

author = "C.J.M. Eijkel and J. Branebjerg and M. Elwenspoek and \{van de Pol\}, F.C.M.",

year = "1990",

month = nov,

day = "26",

language = "English",

pages = "175--179",

booktitle = "Micromechanics Europe 1990",

note = "2nd MicroMechanics Europe Workshop, MME 1990, MME ; Conference date: 26-11-1990 Through 27-11-1990",

}

Eijkel, CJM, Branebjerg, J, Elwenspoek, M & van de Pol, FCM 1990, A new technology for micromachining of silicon: dopant selective HF anodic etching for the realization of low-doped monocrystalline silicon structure. in Micromechanics Europe 1990: papers from the European Workshop on Micromechanics (MME '90). Berlin, pp. 175-179, 2nd MicroMechanics Europe Workshop, MME 1990, Berlin, Berlin, Germany, 26/11/90.

A new technology for micromachining of silicon: dopant selective HF anodic etching for the realization of low-doped monocrystalline silicon structure. / Eijkel, C.J.M.; Branebjerg, J.; Elwenspoek, M. et al.
Micromechanics Europe 1990: papers from the European Workshop on Micromechanics (MME '90). Berlin, 1990. p. 175-179.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - A new technology for micromachining of silicon

T2 - 2nd MicroMechanics Europe Workshop, MME 1990

AU - Eijkel, C.J.M.

AU - Branebjerg, J.

AU - Elwenspoek, M.

AU - van de Pol, F.C.M.

N1 - Conference code: 2

PY - 1990/11/26

Y1 - 1990/11/26

M3 - Conference contribution

SP - 175

EP - 179

BT - Micromechanics Europe 1990

CY - Berlin

Y2 - 26 November 1990 through 27 November 1990

ER -