A novel polishing stop for accurate integration of potassium yttrium double tungstate on a silicon dioxide

Carlijn I. Van Emmerik, Simen M. Martinussen, Jinfeng Mu, Meindert Dijkstra, Roy Kooijman, Sonia M. García-Blanco

Research output: Chapter in Book/Report/Conference proceedingChapterAcademicpeer-review

3 Citations (Scopus)
43 Downloads (Pure)

Abstract

Rare-earth ion doped potassium yttrium double tungstate, RE:KY(WO4)2, is a promising candidate for the realization of on-chip lasers and amplifiers. Two major bottlenecks difficult the realization of compact, high-contrast devices. Firstly, the crystal can only be grown on a lattice matched substrate, leading to a low (<2×10-2) refractive index contrast between core and cladding. Secondly, the required thickness for the high-index contrast waveguides, ∼1 μm, makes a lapping and polishing approach very challenging. In this work we propose a novel polishing stop that will permit to accurately control the final thickness of the KY(WO4)2 waveguide within a few tens of nanometers. A 1 mm thick KY(WO4)2 substrate is flip-chip bonded with an adhesive layer onto a SiO2 substrate. Afterwards a low temperature pulsed laser deposited (PLD) Al2O3 layer-with the desired final thickness of the KY(WO4)2 waveguide core-is deposited on top of the assembly. The sample is then thinned using a multistep lapping and polishing procedure. Earlier work with a polishing stop made from SiO2, showed a decrease of the polishing speed with a factor 3-4, allowing the termination of the process within a tolerance of a few tens of nanometers.

Original languageEnglish
Title of host publicationIntegrated Optics: Devices, Materials, and Technologies XXII
Subtitle of host publicationDevices, Materials, and Technologies XXII
EditorsSonia M. García-Blanco, Pavel Cheben
PublisherSPIE
Pages27
Volume10535
ISBN (Electronic)9781510615557
ISBN (Print)9781510615557
DOIs
Publication statusPublished - 1 Jan 2018
EventSPIE Optoelectronics and Photonic Materials and Devices Conference, OPTO 2018 - The Moscone Center, San Francisco, United States
Duration: 28 Jan 20182 Feb 2018

Publication series

NameINTEGRATED OPTICS: DEVICES, MATERIALS, AND TECHNOLOGIES XXII
ISSN (Print)0277-786X

Conference

ConferenceSPIE Optoelectronics and Photonic Materials and Devices Conference, OPTO 2018
Abbreviated titleOPTO
CountryUnited States
CitySan Francisco
Period28/01/182/02/18

Keywords

  • Bonding
  • Heterogeneous integration
  • Integrated optics
  • Lapping
  • Polishing.
  • Potassium double tungstate
  • heterogeneous integration
  • lapping
  • thinning
  • bonding
  • polishing
  • high-contrast waveguide
  • integrated optics
  • potassium double tungstate

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