A review of silicon microphones

P.R. Scheeper, A.G.H. van der Donk, W. Olthuis, P. Bergveld

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Abstract

Silicon micromachining has successfully been applied to fabricate piezoelectric, piezoresistive and capactive microphones. The use of silicon has allowed the fabrication of microphones with integrated electronic circuitry and the development of the new FET microphone. The introduction of lithographic techniques has resulted in microphones with very small (1 mm2) diaphragms and with specially shaped backplates. The application of corrugated diaphragms seems a promising future development for silicon microphones. It is concluded from a noise consideration that the FET microphone shows a high noise level, which is mainly due to the small sensor capacitance. From this noise consideration, it can be shown that integration of a capacitive microphone and a preamplifier will result in a further reduction of the noise.
Original languageEnglish
Pages (from-to)1-11
JournalSensors and actuators. A: Physical
Volume44
Issue number1
DOIs
Publication statusPublished - 1994

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Silicon
Microphones
microphones
silicon
diaphragms
Diaphragms
Field effect transistors
field effect transistors
preamplifiers
Micromachining
micromachining
Capacitance
capacitance
Fabrication
fabrication
sensors
Sensors
electronics

Cite this

Scheeper, P.R. ; van der Donk, A.G.H. ; Olthuis, W. ; Bergveld, P. / A review of silicon microphones. In: Sensors and actuators. A: Physical. 1994 ; Vol. 44, No. 1. pp. 1-11.
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Scheeper, PR, van der Donk, AGH, Olthuis, W & Bergveld, P 1994, 'A review of silicon microphones' Sensors and actuators. A: Physical, vol. 44, no. 1, pp. 1-11. https://doi.org/10.1016/0924-4247(94)00790-X

A review of silicon microphones. / Scheeper, P.R.; van der Donk, A.G.H.; Olthuis, W.; Bergveld, P.

In: Sensors and actuators. A: Physical, Vol. 44, No. 1, 1994, p. 1-11.

Research output: Contribution to journalArticleAcademicpeer-review

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AB - Silicon micromachining has successfully been applied to fabricate piezoelectric, piezoresistive and capactive microphones. The use of silicon has allowed the fabrication of microphones with integrated electronic circuitry and the development of the new FET microphone. The introduction of lithographic techniques has resulted in microphones with very small (1 mm2) diaphragms and with specially shaped backplates. The application of corrugated diaphragms seems a promising future development for silicon microphones. It is concluded from a noise consideration that the FET microphone shows a high noise level, which is mainly due to the small sensor capacitance. From this noise consideration, it can be shown that integration of a capacitive microphone and a preamplifier will result in a further reduction of the noise.

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