A silicon-based electrical source for surface plasmon polaritons

Robert J. Walters, Rob V.A. van Loon, I. Brunets, Jurriaan Schmitz, Albert Polman

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    2 Citations (Scopus)
    81 Downloads (Pure)

    Abstract

    This work demonstrates the fabrication of a silicon-based electrical source for surface plasmon polaritons (SPPs) at low temperatures using silicon nanocrystal doped alumina within a metal-insulator-metal (MIM) waveguide geometry. The fabrication method uses established microtechnology processes that are compatible with backend CMOS technology. The fabricated device suggests a route forward towards high density, active plasmonic circuits that are integrated with silicon microelectronics.
    Original languageUndefined
    Title of host publicationProceedings of the 6th International Conference on GroupIV Photonics GFP'09
    Place of PublicationPiscataway
    PublisherIEEE Computer Society Press
    Pages74-76
    Number of pages3
    ISBN (Print)978-1-4244-4402-1
    DOIs
    Publication statusPublished - 9 Sep 2009

    Publication series

    Name
    PublisherIEEE Computer Society Press

    Keywords

    • METIS-265806
    • SC-ICF: Integrated Circuit Fabrication
    • EWI-17465
    • IR-70009

    Cite this

    Walters, R. J., van Loon, R. V. A., Brunets, I., Schmitz, J., & Polman, A. (2009). A silicon-based electrical source for surface plasmon polaritons. In Proceedings of the 6th International Conference on GroupIV Photonics GFP'09 (pp. 74-76). [10.1109/GROUP4.2009.5338358] Piscataway: IEEE Computer Society Press. https://doi.org/10.1109/GROUP4.2009.5338358
    Walters, Robert J. ; van Loon, Rob V.A. ; Brunets, I. ; Schmitz, Jurriaan ; Polman, Albert. / A silicon-based electrical source for surface plasmon polaritons. Proceedings of the 6th International Conference on GroupIV Photonics GFP'09. Piscataway : IEEE Computer Society Press, 2009. pp. 74-76
    @inproceedings{52dc96713bae4cebb81a548a559b768b,
    title = "A silicon-based electrical source for surface plasmon polaritons",
    abstract = "This work demonstrates the fabrication of a silicon-based electrical source for surface plasmon polaritons (SPPs) at low temperatures using silicon nanocrystal doped alumina within a metal-insulator-metal (MIM) waveguide geometry. The fabrication method uses established microtechnology processes that are compatible with backend CMOS technology. The fabricated device suggests a route forward towards high density, active plasmonic circuits that are integrated with silicon microelectronics.",
    keywords = "METIS-265806, SC-ICF: Integrated Circuit Fabrication, EWI-17465, IR-70009",
    author = "Walters, {Robert J.} and {van Loon}, {Rob V.A.} and I. Brunets and Jurriaan Schmitz and Albert Polman",
    note = "10.1109/GROUP4.2009.5338358",
    year = "2009",
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    Walters, RJ, van Loon, RVA, Brunets, I, Schmitz, J & Polman, A 2009, A silicon-based electrical source for surface plasmon polaritons. in Proceedings of the 6th International Conference on GroupIV Photonics GFP'09., 10.1109/GROUP4.2009.5338358, IEEE Computer Society Press, Piscataway, pp. 74-76. https://doi.org/10.1109/GROUP4.2009.5338358

    A silicon-based electrical source for surface plasmon polaritons. / Walters, Robert J.; van Loon, Rob V.A.; Brunets, I.; Schmitz, Jurriaan; Polman, Albert.

    Proceedings of the 6th International Conference on GroupIV Photonics GFP'09. Piscataway : IEEE Computer Society Press, 2009. p. 74-76 10.1109/GROUP4.2009.5338358.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    TY - GEN

    T1 - A silicon-based electrical source for surface plasmon polaritons

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    AU - van Loon, Rob V.A.

    AU - Brunets, I.

    AU - Schmitz, Jurriaan

    AU - Polman, Albert

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    N2 - This work demonstrates the fabrication of a silicon-based electrical source for surface plasmon polaritons (SPPs) at low temperatures using silicon nanocrystal doped alumina within a metal-insulator-metal (MIM) waveguide geometry. The fabrication method uses established microtechnology processes that are compatible with backend CMOS technology. The fabricated device suggests a route forward towards high density, active plasmonic circuits that are integrated with silicon microelectronics.

    AB - This work demonstrates the fabrication of a silicon-based electrical source for surface plasmon polaritons (SPPs) at low temperatures using silicon nanocrystal doped alumina within a metal-insulator-metal (MIM) waveguide geometry. The fabrication method uses established microtechnology processes that are compatible with backend CMOS technology. The fabricated device suggests a route forward towards high density, active plasmonic circuits that are integrated with silicon microelectronics.

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    KW - SC-ICF: Integrated Circuit Fabrication

    KW - EWI-17465

    KW - IR-70009

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    Walters RJ, van Loon RVA, Brunets I, Schmitz J, Polman A. A silicon-based electrical source for surface plasmon polaritons. In Proceedings of the 6th International Conference on GroupIV Photonics GFP'09. Piscataway: IEEE Computer Society Press. 2009. p. 74-76. 10.1109/GROUP4.2009.5338358 https://doi.org/10.1109/GROUP4.2009.5338358