A silicon-based electrical source for surface plasmon polaritons

Robert J. Walters, Rob V.A. van Loon, I. Brunets, Jurriaan Schmitz, Albert Polman

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    2 Citations (Scopus)
    157 Downloads (Pure)

    Abstract

    This work demonstrates the fabrication of a silicon-based electrical source for surface plasmon polaritons (SPPs) at low temperatures using silicon nanocrystal doped alumina within a metal-insulator-metal (MIM) waveguide geometry. The fabrication method uses established microtechnology processes that are compatible with backend CMOS technology. The fabricated device suggests a route forward towards high density, active plasmonic circuits that are integrated with silicon microelectronics.
    Original languageUndefined
    Title of host publicationProceedings of the 6th International Conference on GroupIV Photonics GFP'09
    Place of PublicationPiscataway
    PublisherIEEE Computer Society Press
    Pages74-76
    Number of pages3
    ISBN (Print)978-1-4244-4402-1
    DOIs
    Publication statusPublished - 9 Sep 2009
    Event6th International Conference on GroupIV Photonics GFP'09 - San Francisco, USA
    Duration: 9 Sep 200911 Sep 2009

    Publication series

    Name
    PublisherIEEE Computer Society Press

    Conference

    Conference6th International Conference on GroupIV Photonics GFP'09
    Period9/09/0911/09/09
    Other9-11 Sept 2009

    Keywords

    • METIS-265806
    • SC-ICF: Integrated Circuit Fabrication
    • EWI-17465
    • IR-70009

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