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A SIMS study of cation and anion diffusion in tantalum oxide

  • R. A. De Souza
  • , R. Waser
  • , S. Hoffmann-Eifert
  • , F. Gunkel
  • , K. Skaja
  • , H. Schraknepper
  • , U. N. Gries

Research output: Contribution to journalArticleAcademicpeer-review

Original languageEnglish
Pages (from-to)989-996
JournalPhysical chemistry chemical physics
Volume20
DOIs
Publication statusPublished - 2018
Externally publishedYes

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