Achieving chemical stability in thermoelectric NaxCoO2 thin films

Peter Brinks; H.T. Heijmerikx; T.A. Hendriks; G. Rijnders; M. Huijben

doi:10.1039/c2ra20734f

Achieving chemical stability in thermoelectric NaxCoO2 thin films

Peter Brinks, H.T. Heijmerikx, T.A. Hendriks, G. Rijnders, M. Huijben

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

Stability issues in thermoelectric NaxCoO2 thin films have been solved by the addition of an in situ amorphous AlOx capping layer, which prevents previously reported degradation when exposed to air.

Original language	English
Pages (from-to)	6023-6027
Number of pages	5
Journal	RSC advances
Volume	2
Issue number	14
DOIs	https://doi.org/10.1039/c2ra20734f
Publication status	Published - 2012

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title = "Achieving chemical stability in thermoelectric NaxCoO2 thin films",

abstract = "Stability issues in thermoelectric NaxCoO2 thin films have been solved by the addition of an in situ amorphous AlOx capping layer, which prevents previously reported degradation when exposed to air.",

author = "Peter Brinks and H.T. Heijmerikx and T.A. Hendriks and G. Rijnders and M. Huijben",

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doi = "10.1039/c2ra20734f",

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AU - Brinks, Peter

AU - Heijmerikx, H.T.

AU - Hendriks, T.A.

AU - Rijnders, G.

AU - Huijben, M.

PY - 2012

Y1 - 2012

N2 - Stability issues in thermoelectric NaxCoO2 thin films have been solved by the addition of an in situ amorphous AlOx capping layer, which prevents previously reported degradation when exposed to air.

AB - Stability issues in thermoelectric NaxCoO2 thin films have been solved by the addition of an in situ amorphous AlOx capping layer, which prevents previously reported degradation when exposed to air.

U2 - 10.1039/c2ra20734f

DO - 10.1039/c2ra20734f

M3 - Article

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VL - 2

SP - 6023

EP - 6027

JO - RSC advances

JF - RSC advances

IS - 14

ER -

Achieving chemical stability in thermoelectric NaxCoO2 thin films

Abstract

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