Achieving chemical stability in thermoelectric NaxCoO2 thin films

Peter Brinks, H.T. Heijmerikx, T.A. Hendriks, Augustinus J.H.M. Rijnders, Mark Huijben

Research output: Contribution to journalArticleAcademicpeer-review

14 Citations (Scopus)
51 Downloads (Pure)

Abstract

Stability issues in thermoelectric NaxCoO2 thin films have been solved by the addition of an in situ amorphous AlOx capping layer, which prevents previously reported degradation when exposed to air.
Original languageEnglish
Pages (from-to)6023-6027
Number of pages5
JournalRSC advances
Volume2
Issue number14
DOIs
Publication statusPublished - 2012

Keywords

  • IR-81889
  • METIS-288510

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