Actinic Inspection of the EUV Optical Parameters of Lithographic Materials with Lab-Based Radiometry and Reflectometry

Kevin M. Dorney*, Nicola N. Kissoon, Fabian Holzmeier, Esben W. Larsen, Dhirendra P. Singh, Shikhar Arvind, Sayantani Santra, Roberto Fallica, Igor Makhotkin, Vicky Philipsen, Stefan De Gendt, Claudia Fleischmann, Paul A.W. van der Heide, John S. Petersen

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

1 Citation (Scopus)
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The interaction of EUV light with matter is a critical step in EUV lithographic processes and optimization of the optical material parameters of photoresists and reflector/absorber stacks is crucial to harness the full power of EUV lithography. To optimize these materials, accurate measurements of EUV absorption and reflection are needed to extract the corresponding actinic optical properties and structural parameters. Here, we report on two endstations within imec's AttoLab that enable actinic EUV absorption and reflection measurements. We commission these tools with measurements on model thin film and photoresist systems and provide extracted optical parameters as well as absorption kinetics, respectively. These results showcase the power of these tools for providing crucial data for material optimization and lithographic simulation.

Original languageEnglish
Title of host publicationOptical and EUV Nanolithography XXXVI
EditorsAnna Lio
ISBN (Electronic)9781510660953
Publication statusPublished - 28 Apr 2023
EventOptical and EUV Nanolithography XXXVI 2023 - San Jose, United States
Duration: 27 Feb 20232 Mar 2023
Conference number: 36

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
ISSN (Print)0277-786X
ISSN (Electronic)1996-756X


ConferenceOptical and EUV Nanolithography XXXVI 2023
Country/TerritoryUnited States
CitySan Jose


  • absorption coefficient
  • Dill parameters
  • EUV
  • EUV lithography
  • interfaces
  • optical constants
  • photoresists
  • reflectometry
  • thin films
  • 2023 OA procedure


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