Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths

Muharrem Bayraktar, W.A. Wessels, Christopher James Lee, F.A. van Goor, Gertjan Koster, Augustinus J.H.M. Rijnders, Frederik Bijkerk

Research output: Contribution to journalArticleAcademicpeer-review

6 Citations (Scopus)


We propose an active multilayer mirror structure for EUV wavelengths which can be adjusted to compensate for reflectance changes. The multilayer structure tunes the reflectance via an integrated piezoelectric layer that can change its dimension due to an externally applied voltage. Here, we present design and optimization of the mirror structure for maximum reflectance tuning. In addition, we present preliminary results showing that the deposition of piezoelectric thin films with the requisite layer smoothness and crystal structure are possible. Finally, polarization switching of the smoothest piezoelectric film is presented.
Original languageEnglish
Article number494001
Pages (from-to)494001-1-494001-5
Number of pages5
JournalJournal of physics D: applied physics
Issue number49
Publication statusPublished - 19 Nov 2012


  • METIS-287510
  • IR-81151


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