Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths

Muharrem Bayraktar; W.A. Wessels; Christopher James Lee; F.A. van Goor; Gertjan Koster; Augustinus J.H.M. Rijnders; Frederik Bijkerk

doi:10.1088/0022-3727/45/49/494001

Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths

Muharrem Bayraktar, W.A. Wessels, Christopher James Lee, F.A. van Goor, Gertjan Koster, Augustinus J.H.M. Rijnders, Frederik Bijkerk

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

We propose an active multilayer mirror structure for EUV wavelengths which can be adjusted to compensate for reflectance changes. The multilayer structure tunes the reflectance via an integrated piezoelectric layer that can change its dimension due to an externally applied voltage. Here, we present design and optimization of the mirror structure for maximum reflectance tuning. In addition, we present preliminary results showing that the deposition of piezoelectric thin films with the requisite layer smoothness and crystal structure are possible. Finally, polarization switching of the smoothest piezoelectric film is presented.

Original language	English
Article number	494001
Pages (from-to)	494001-1-494001-5
Number of pages	5
Journal	Journal of physics D: applied physics
Volume	45
Issue number	49
DOIs	https://doi.org/10.1088/0022-3727/45/49/494001
Publication status	Published - 19 Nov 2012

Keywords

METIS-287510
IR-81151

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10.1088/0022-3727/45/49/494001Licence: CC BY-NC-SA

JPhysD_bayraktar_2012Final published version, 251 KBLicence: CC BY-NC-SA

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title = "Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths",

abstract = "We propose an active multilayer mirror structure for EUV wavelengths which can be adjusted to compensate for reflectance changes. The multilayer structure tunes the reflectance via an integrated piezoelectric layer that can change its dimension due to an externally applied voltage. Here, we present design and optimization of the mirror structure for maximum reflectance tuning. In addition, we present preliminary results showing that the deposition of piezoelectric thin films with the requisite layer smoothness and crystal structure are possible. Finally, polarization switching of the smoothest piezoelectric film is presented.",

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T1 - Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths

AU - Bayraktar, Muharrem

AU - Wessels, W.A.

AU - Lee, Christopher James

AU - van Goor, F.A.

AU - Koster, Gertjan

AU - Rijnders, Augustinus J.H.M.

AU - Bijkerk, Frederik

N1 - Open access article

PY - 2012/11/19

Y1 - 2012/11/19

N2 - We propose an active multilayer mirror structure for EUV wavelengths which can be adjusted to compensate for reflectance changes. The multilayer structure tunes the reflectance via an integrated piezoelectric layer that can change its dimension due to an externally applied voltage. Here, we present design and optimization of the mirror structure for maximum reflectance tuning. In addition, we present preliminary results showing that the deposition of piezoelectric thin films with the requisite layer smoothness and crystal structure are possible. Finally, polarization switching of the smoothest piezoelectric film is presented.

AB - We propose an active multilayer mirror structure for EUV wavelengths which can be adjusted to compensate for reflectance changes. The multilayer structure tunes the reflectance via an integrated piezoelectric layer that can change its dimension due to an externally applied voltage. Here, we present design and optimization of the mirror structure for maximum reflectance tuning. In addition, we present preliminary results showing that the deposition of piezoelectric thin films with the requisite layer smoothness and crystal structure are possible. Finally, polarization switching of the smoothest piezoelectric film is presented.

KW - METIS-287510

KW - IR-81151

U2 - 10.1088/0022-3727/45/49/494001

DO - 10.1088/0022-3727/45/49/494001

M3 - Article

SN - 0022-3727

VL - 45

SP - 494001-1-494001-5

JO - Journal of physics D: applied physics

JF - Journal of physics D: applied physics

IS - 49

M1 - 494001

ER -

Active multilayer mirrors for reflectance tuning at extreme ultraviolet (EUV) wavelengths

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Keywords

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