Adaptive multilayer optics for extreme ultraviolet wavelengths

Research output: ThesisPhD Thesis - Research UT, graduation UT

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Abstract

In this thesis we describe the development of a new class of optical components to enhance the imaging performance by enabling adaptations of the optics. When used at extreme ultraviolet (EUV) wavelengths, such ‘adaptive optics’ offers the potential to achieve the highest spatial resolution in imaging known to date, i.e., a resolution down to several nanometers. These optics are discussed, e.g., in the field of photolithography for the fabrication of more energy efficient and faster electronic equipment. The topics in this thesis can be subdivided into two parts. The first part includes a mirror design that can be used to enhance the spectral quality of EUV light sources. Our design consists of a diffractive Fresnel zone plate patterned in the surface of a curved mirror to achieve spectral purification, i.e., removing undesired wavelengths of the EUV light sources. The removed light is recycled to produce more EUV light. This design achieves four orders of magnitude purification and provides a 35% improvement in efficiency. The second part of the thesis describes a new class of adaptive multilayer mirrors that can be used to correct wavefront distortions, reflectance degradations or wavelength deviations. These adaptive optics contain integrated crystalline piezoelectric thin films of which the film thickness can be adjusted by an externally applied voltage. Because the optics substrates typically have an amorphous structure, so far it was not possible to grow high quality crystalline piezoelectric films on them. We utilized crystalline nanosheets on these substrates to grow the highest quality, i.e., epitaxial, piezoelectric films (PbZr0.52Ti0.48O3, PZT). The PZT films show a record high piezoelectric coefficient of 98 pm/V, although the piezoelectric response in this case is still reduced due to clamping by the substrate. We minimized the clamping effect by depositing films with a columnar structure, which enhances the voltage-controlled change in film thickness. In these films we measured a piezoelectric response of 280 pm/V, the highest value reported on glass substrates. Importantly, the developed films can produce a stroke of 25 nm. This order of magnitude is useful when considering to correct EUV wavefront distortions.
Original languageEnglish
Awarding Institution
  • University of Twente
Supervisors/Advisors
  • Bijkerk, Fred, Supervisor
  • Boller, K.-J., Supervisor
Award date26 Feb 2015
Place of PublicationEnschede
Publisher
Print ISBNs978-90-365-3845-9
DOIs
Publication statusPublished - 26 Feb 2015

Fingerprint

optics
theses
wavelengths
ultraviolet radiation
mirrors
adaptive optics
purification
light sources
film thickness
electronic equipment
electric potential
photolithography
strokes
spatial resolution
degradation
deviation
reflectance
fabrication
glass
high resolution

Keywords

  • METIS-309471
  • IR-94641

Cite this

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title = "Adaptive multilayer optics for extreme ultraviolet wavelengths",
abstract = "In this thesis we describe the development of a new class of optical components to enhance the imaging performance by enabling adaptations of the optics. When used at extreme ultraviolet (EUV) wavelengths, such ‘adaptive optics’ offers the potential to achieve the highest spatial resolution in imaging known to date, i.e., a resolution down to several nanometers. These optics are discussed, e.g., in the field of photolithography for the fabrication of more energy efficient and faster electronic equipment. The topics in this thesis can be subdivided into two parts. The first part includes a mirror design that can be used to enhance the spectral quality of EUV light sources. Our design consists of a diffractive Fresnel zone plate patterned in the surface of a curved mirror to achieve spectral purification, i.e., removing undesired wavelengths of the EUV light sources. The removed light is recycled to produce more EUV light. This design achieves four orders of magnitude purification and provides a 35{\%} improvement in efficiency. The second part of the thesis describes a new class of adaptive multilayer mirrors that can be used to correct wavefront distortions, reflectance degradations or wavelength deviations. These adaptive optics contain integrated crystalline piezoelectric thin films of which the film thickness can be adjusted by an externally applied voltage. Because the optics substrates typically have an amorphous structure, so far it was not possible to grow high quality crystalline piezoelectric films on them. We utilized crystalline nanosheets on these substrates to grow the highest quality, i.e., epitaxial, piezoelectric films (PbZr0.52Ti0.48O3, PZT). The PZT films show a record high piezoelectric coefficient of 98 pm/V, although the piezoelectric response in this case is still reduced due to clamping by the substrate. We minimized the clamping effect by depositing films with a columnar structure, which enhances the voltage-controlled change in film thickness. In these films we measured a piezoelectric response of 280 pm/V, the highest value reported on glass substrates. Importantly, the developed films can produce a stroke of 25 nm. This order of magnitude is useful when considering to correct EUV wavefront distortions.",
keywords = "METIS-309471, IR-94641",
author = "Muharrem Bayraktar",
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year = "2015",
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doi = "10.3990/1.9789036538459",
language = "English",
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}

Adaptive multilayer optics for extreme ultraviolet wavelengths. / Bayraktar, Muharrem.

Enschede : Universiteit Twente, 2015. 124 p.

Research output: ThesisPhD Thesis - Research UT, graduation UT

TY - THES

T1 - Adaptive multilayer optics for extreme ultraviolet wavelengths

AU - Bayraktar, Muharrem

N1 - promotiepremie 100% LPNO

PY - 2015/2/26

Y1 - 2015/2/26

N2 - In this thesis we describe the development of a new class of optical components to enhance the imaging performance by enabling adaptations of the optics. When used at extreme ultraviolet (EUV) wavelengths, such ‘adaptive optics’ offers the potential to achieve the highest spatial resolution in imaging known to date, i.e., a resolution down to several nanometers. These optics are discussed, e.g., in the field of photolithography for the fabrication of more energy efficient and faster electronic equipment. The topics in this thesis can be subdivided into two parts. The first part includes a mirror design that can be used to enhance the spectral quality of EUV light sources. Our design consists of a diffractive Fresnel zone plate patterned in the surface of a curved mirror to achieve spectral purification, i.e., removing undesired wavelengths of the EUV light sources. The removed light is recycled to produce more EUV light. This design achieves four orders of magnitude purification and provides a 35% improvement in efficiency. The second part of the thesis describes a new class of adaptive multilayer mirrors that can be used to correct wavefront distortions, reflectance degradations or wavelength deviations. These adaptive optics contain integrated crystalline piezoelectric thin films of which the film thickness can be adjusted by an externally applied voltage. Because the optics substrates typically have an amorphous structure, so far it was not possible to grow high quality crystalline piezoelectric films on them. We utilized crystalline nanosheets on these substrates to grow the highest quality, i.e., epitaxial, piezoelectric films (PbZr0.52Ti0.48O3, PZT). The PZT films show a record high piezoelectric coefficient of 98 pm/V, although the piezoelectric response in this case is still reduced due to clamping by the substrate. We minimized the clamping effect by depositing films with a columnar structure, which enhances the voltage-controlled change in film thickness. In these films we measured a piezoelectric response of 280 pm/V, the highest value reported on glass substrates. Importantly, the developed films can produce a stroke of 25 nm. This order of magnitude is useful when considering to correct EUV wavefront distortions.

AB - In this thesis we describe the development of a new class of optical components to enhance the imaging performance by enabling adaptations of the optics. When used at extreme ultraviolet (EUV) wavelengths, such ‘adaptive optics’ offers the potential to achieve the highest spatial resolution in imaging known to date, i.e., a resolution down to several nanometers. These optics are discussed, e.g., in the field of photolithography for the fabrication of more energy efficient and faster electronic equipment. The topics in this thesis can be subdivided into two parts. The first part includes a mirror design that can be used to enhance the spectral quality of EUV light sources. Our design consists of a diffractive Fresnel zone plate patterned in the surface of a curved mirror to achieve spectral purification, i.e., removing undesired wavelengths of the EUV light sources. The removed light is recycled to produce more EUV light. This design achieves four orders of magnitude purification and provides a 35% improvement in efficiency. The second part of the thesis describes a new class of adaptive multilayer mirrors that can be used to correct wavefront distortions, reflectance degradations or wavelength deviations. These adaptive optics contain integrated crystalline piezoelectric thin films of which the film thickness can be adjusted by an externally applied voltage. Because the optics substrates typically have an amorphous structure, so far it was not possible to grow high quality crystalline piezoelectric films on them. We utilized crystalline nanosheets on these substrates to grow the highest quality, i.e., epitaxial, piezoelectric films (PbZr0.52Ti0.48O3, PZT). The PZT films show a record high piezoelectric coefficient of 98 pm/V, although the piezoelectric response in this case is still reduced due to clamping by the substrate. We minimized the clamping effect by depositing films with a columnar structure, which enhances the voltage-controlled change in film thickness. In these films we measured a piezoelectric response of 280 pm/V, the highest value reported on glass substrates. Importantly, the developed films can produce a stroke of 25 nm. This order of magnitude is useful when considering to correct EUV wavefront distortions.

KW - METIS-309471

KW - IR-94641

U2 - 10.3990/1.9789036538459

DO - 10.3990/1.9789036538459

M3 - PhD Thesis - Research UT, graduation UT

SN - 978-90-365-3845-9

PB - Universiteit Twente

CY - Enschede

ER -