Abstract
By means of Auger electron spectroscopy (AES) we have monitored the room temperature adsorption of O2 and N2O on the clean Si(0 0 1)2 × 1 surface. We have found, for the first time, a significant variation in the intensity ratio of the K L1 L1 and K L23 L23 O Auger lines in the submonolayer range. This variation can be related to a change in bonding configuration of the oxygen atom/molecule in the initial adsorption stage in which the influence of inter-atomic matrix elements of the Auger process cannot be neglected.
Original language | English |
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Pages (from-to) | 239-242 |
Number of pages | 4 |
Journal | Solid state communications |
Volume | 77 |
Issue number | 3 |
DOIs | |
Publication status | Published - 1991 |