Adsorption of atomic and molecular oxygen on Si(100)2x1: coverage dependence of the Auger O KVV lineshape

H. Wormeester, H.J. Borg, D. Terpstra, E.G. Keim, A. van Silfhout

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Abstract

By means of Auger electron spectroscopy (AES) we have monitored the room temperature adsorption of O2 and N2O on the clean Si(0 0 1)2 × 1 surface. We have found, for the first time, a significant variation in the intensity ratio of the K L1 L1 and K L23 L23 O Auger lines in the submonolayer range. This variation can be related to a change in bonding configuration of the oxygen atom/molecule in the initial adsorption stage in which the influence of inter-atomic matrix elements of the Auger process cannot be neglected.
Original languageEnglish
Pages (from-to)239-242
Number of pages4
JournalSolid state communications
Volume77
Issue number3
DOIs
Publication statusPublished - 1991

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