Advanced sacrificial poly-Si technology for fluidic systems

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Abstract

    Sacrificial poly-Si etching can be used to create thin cavities and channels. By combining it with anisotropic KOH etching of a mono-Si substrate, important components for fluidic systems, like V-grooved channels, thin sandwiched channels, channel crossings and membrane filters and injectors, have been fabricated in a single etch step.
    Original languageEnglish
    Title of host publicationTransducers ’01 Eurosensors XV
    Subtitle of host publicationThe 11th International Conference on Solid-State Sensors and Actuators June 10 – 14, 2001 Munich, Germany
    Place of PublicationBerlin, Heidelberg
    PublisherSpringer
    Pages624-627
    ISBN (Electronic)978-3-642-59497-7
    ISBN (Print)978-3-540-42150-4
    DOIs
    Publication statusPublished - 10 Jun 2001
    Event15th European Conference on Solid-State Transducers, Eurosensors XV - Munich, Germany
    Duration: 10 Jun 200114 Jun 2001

    Conference

    Conference15th European Conference on Solid-State Transducers, Eurosensors XV
    CountryGermany
    CityMunich
    Period10/06/0114/06/01

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  • Cite this

    Berenschot, J. W., Tas, N. R., Lammerink, T. S. J., Elwenspoek, M., & van den Berg, A. (2001). Advanced sacrificial poly-Si technology for fluidic systems. In Transducers ’01 Eurosensors XV: The 11th International Conference on Solid-State Sensors and Actuators June 10 – 14, 2001 Munich, Germany (pp. 624-627). Berlin, Heidelberg: Springer. https://doi.org/10.1007/978-3-642-59497-7_148