Advanced sacrificial poly-Si technology for fluidic systems

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    Sacrificial poly-Si etching can be used to create thin cavities and channels. By combining it with anisotropic KOH etching of a mono-Si substrate, important components for fluidic systems, such as V-grooved channels, thin sandwiched channels, channel crossings and membrane filters and injectors, have been fabricated in a single etch step.
    Original languageEnglish
    Pages (from-to)621-624
    Number of pages4
    JournalJournal of micromechanics and microengineering
    Issue number5
    Publication statusPublished - Sept 2002


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