Advanced sacrificial poly-Si technology for fluidic systems

    Research output: Contribution to journalArticleAcademicpeer-review

    17 Citations (Scopus)
    2 Downloads (Pure)

    Abstract

    Sacrificial poly-Si etching can be used to create thin cavities and channels. By combining it with anisotropic KOH etching of a mono-Si substrate, important components for fluidic systems, such as V-grooved channels, thin sandwiched channels, channel crossings and membrane filters and injectors, have been fabricated in a single etch step.
    Original languageEnglish
    Pages (from-to)621-624
    Number of pages4
    JournalJournal of micromechanics and microengineering
    Volume12
    Issue number5
    DOIs
    Publication statusPublished - Sept 2002

    Fingerprint

    Dive into the research topics of 'Advanced sacrificial poly-Si technology for fluidic systems'. Together they form a unique fingerprint.

    Cite this