Abstract
Sacrificial poly-Si etching can be used to create thin cavities and channels. By combining it with anisotropic KOH etching of a mono-Si substrate, important components for fluidic systems, such as V-grooved channels, thin sandwiched channels, channel crossings and membrane filters and injectors, have been fabricated in a single etch step.
| Original language | English |
|---|---|
| Pages (from-to) | 621-624 |
| Number of pages | 4 |
| Journal | Journal of micromechanics and microengineering |
| Volume | 12 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - Sept 2002 |
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