Advanced sacrificial poly-Si technology for fluidic systems

J.W. Berenschot; N.R. Tas; T.S.J. Lammerink; M. Elwenspoek; A. van den Berg

doi:10.1007/978-3-642-59497-7_148

Advanced sacrificial poly-Si technology for fluidic systems

J.W. Berenschot
, N.R. Tas
, T.S.J. Lammerink
, M. Elwenspoek
, A. van den Berg

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

Sacrificial poly-Si etching can be used to create thin cavities and channels. By combining it with anisotropic KOH etching of a mono-Si substrate, important components for fluidic systems, like V-grooved channels, thin sandwiched channels, channel crossings and membrane filters and injectors, have been fabricated in a single etch step.

Original language	English
Title of host publication	Transducers ’01 Eurosensors XV
Subtitle of host publication	The 11th International Conference on Solid-State Sensors and Actuators June 10 – 14, 2001 Munich, Germany
Place of Publication	Berlin, Heidelberg
Publisher	Springer
Pages	624-627
ISBN (Electronic)	978-3-642-59497-7
ISBN (Print)	978-3-540-42150-4
DOIs	https://doi.org/10.1007/978-3-642-59497-7_148
Publication status	Published - 10 Jun 2001
Event	15th European Conference on Solid-State Transducers, Eurosensors XV - Munich, Germany Duration: 10 Jun 2001 → 14 Jun 2001

Conference

Conference	15th European Conference on Solid-State Transducers, Eurosensors XV
Country/Territory	Germany
City	Munich
Period	10/06/01 → 14/06/01

Access to Document

10.1007/978-3-642-59497-7_148

Cite this

Berenschot, J. W., Tas, N. R., Lammerink, T. S. J., Elwenspoek, M., & van den Berg, A. (2001). Advanced sacrificial poly-Si technology for fluidic systems. In Transducers ’01 Eurosensors XV: The 11th International Conference on Solid-State Sensors and Actuators June 10 – 14, 2001 Munich, Germany (pp. 624-627). Springer. https://doi.org/10.1007/978-3-642-59497-7_148

@inproceedings{f4c87116e91d4a868375f06bc6b7c40f,

title = "Advanced sacrificial poly-Si technology for fluidic systems",

abstract = "Sacrificial poly-Si etching can be used to create thin cavities and channels. By combining it with anisotropic KOH etching of a mono-Si substrate, important components for fluidic systems, like V-grooved channels, thin sandwiched channels, channel crossings and membrane filters and injectors, have been fabricated in a single etch step.",

author = "J.W. Berenschot and N.R. Tas and T.S.J. Lammerink and M. Elwenspoek and \{van den Berg\}, A.",

year = "2001",

month = jun,

day = "10",

doi = "10.1007/978-3-642-59497-7\_148",

language = "English",

isbn = "978-3-540-42150-4",

pages = "624--627",

booktitle = "Transducers {\textquoteright}01 Eurosensors XV",

publisher = "Springer",

address = "Germany",

note = "15th European Conference on Solid-State Transducers, Eurosensors XV ; Conference date: 10-06-2001 Through 14-06-2001",

}

Berenschot, JW , Tas, NR, Lammerink, TSJ, Elwenspoek, M & van den Berg, A 2001, Advanced sacrificial poly-Si technology for fluidic systems. in Transducers ’01 Eurosensors XV: The 11th International Conference on Solid-State Sensors and Actuators June 10 – 14, 2001 Munich, Germany. Springer, Berlin, Heidelberg, pp. 624-627, 15th European Conference on Solid-State Transducers, Eurosensors XV, Munich, Germany, 10/06/01. https://doi.org/10.1007/978-3-642-59497-7_148

Advanced sacrificial poly-Si technology for fluidic systems. / Berenschot, J.W.; Tas, N.R.; Lammerink, T.S.J. et al.
Transducers ’01 Eurosensors XV: The 11th International Conference on Solid-State Sensors and Actuators June 10 – 14, 2001 Munich, Germany. Berlin, Heidelberg: Springer, 2001. p. 624-627.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Advanced sacrificial poly-Si technology for fluidic systems

AU - Berenschot, J.W.

AU - Tas, N.R.

AU - Lammerink, T.S.J.

AU - Elwenspoek, M.

AU - van den Berg, A.

PY - 2001/6/10

Y1 - 2001/6/10

N2 - Sacrificial poly-Si etching can be used to create thin cavities and channels. By combining it with anisotropic KOH etching of a mono-Si substrate, important components for fluidic systems, like V-grooved channels, thin sandwiched channels, channel crossings and membrane filters and injectors, have been fabricated in a single etch step.

AB - Sacrificial poly-Si etching can be used to create thin cavities and channels. By combining it with anisotropic KOH etching of a mono-Si substrate, important components for fluidic systems, like V-grooved channels, thin sandwiched channels, channel crossings and membrane filters and injectors, have been fabricated in a single etch step.

U2 - 10.1007/978-3-642-59497-7_148

DO - 10.1007/978-3-642-59497-7_148

M3 - Conference contribution

SN - 978-3-540-42150-4

SP - 624

EP - 627

BT - Transducers ’01 Eurosensors XV

PB - Springer

CY - Berlin, Heidelberg

T2 - 15th European Conference on Solid-State Transducers, Eurosensors XV

Y2 - 10 June 2001 through 14 June 2001

ER -

Advanced sacrificial poly-Si technology for fluidic systems

Abstract

Conference

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