Aerosol reactors for thin film deposition and their application to ZnS:Cl doped films

F.J. Martin; H. Albers; Paul Lambeck; Th.J.A. Popma

doi:10.1016/0021-8502(93)90253-6

Aerosol reactors for thin film deposition and their application to ZnS:Cl doped films

F.J. Martin, H. Albers, Paul Lambeck, Th.J.A. Popma

Research output: Contribution to journal › Article › Academic › peer-review

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Original language	English
Pages (from-to)	321-322
Number of pages	2
Journal	Journal of aerosol science
Volume	24
Issue number	S1
DOIs	https://doi.org/10.1016/0021-8502(93)90253-6
Publication status	Published - 1993
Event	European Aerosol Conference, AEC 1993 - Duisburg, Germany Duration: 4 Oct 1993 → 8 Oct 1993

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10.1016/0021-8502(93)90253-6

Martin93aerosolFinal published version, 243 KB

1 Oral presentation

Aerosol reactors for thin film deposition and their application to ZnS:Cl doped films
F.J. Martin (Speaker), H. Albers (Speaker), Paul Lambeck (Speaker) & Th.J.A. Popma (Speaker)
6 Oct 1993
Activity: Talk or presentation › Oral presentation

Cite this

@article{5b3430c0119e49f0b2eab55e67d2cd3a,

title = "Aerosol reactors for thin film deposition and their application to ZnS:Cl doped films",

author = "F.J. Martin and H. Albers and Paul Lambeck and Th.J.A. Popma",

year = "1993",

doi = "10.1016/0021-8502(93)90253-6",

language = "English",

volume = "24",

pages = "321--322",

journal = "Journal of aerosol science",

issn = "0021-8502",

publisher = "Elsevier",

number = "S1",

note = "European Aerosol Conference, AEC 1993, AEC ; Conference date: 04-10-1993 Through 08-10-1993",

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TY - JOUR

T1 - Aerosol reactors for thin film deposition and their application to ZnS:Cl doped films

AU - Martin, F.J.

AU - Albers, H.

AU - Lambeck, Paul

AU - Popma, Th.J.A.

PY - 1993

Y1 - 1993

U2 - 10.1016/0021-8502(93)90253-6

DO - 10.1016/0021-8502(93)90253-6

M3 - Article

VL - 24

SP - 321

EP - 322

JO - Journal of aerosol science

JF - Journal of aerosol science

SN - 0021-8502

IS - S1

T2 - European Aerosol Conference, AEC 1993

Y2 - 4 October 1993 through 8 October 1993

ER -

Aerosol reactors for thin film deposition and their application to ZnS:Cl doped films

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Aerosol reactors for thin film deposition and their application to ZnS:Cl doped films

Cite this