AL2O3 and Y2O3 Thin Films for Active Integrated Optical Waveguide Devices

J. Bradley; F. Ay; Kerstin Worhoff; Markus Pollnau

AL₂O₃ and Y₂O₃ Thin Films for Active Integrated Optical Waveguide Devices

J. Bradley
, F. Ay
, Kerstin Worhoff
, Markus Pollnau

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

156 Downloads (Pure)

Abstract

$Al_{2}O_{3}$ and $Y_{2}O_{3}$ are both very promising host materials for active integrated optics applications such as rare-earth ion doped waveguide lasers. In this paper, a reactive co-sputtering process for stable, target condition-independent deposition of $Al_{2}O_{3}$ layers with high optical quality is discussed. The loss of as-deposited $Al_{2}O_{3}$ waveguides in the near infrared wavelength range was 0.3 dB/cm. Reactive ion etching of both $Al_{3}O_{2}$ and $Y_{2}O_{3}$ thin films for defining channel waveguide structures was investigated and compared using $CF_{4}/O_{2}, BCl_{3}, HBr$ and $CL_{2}$ inductively coupled plasmas.

Original language	Undefined
Title of host publication	11th Annual Symposium IEEE/LEOS Benelux
Editors	A.M.J. Koonen, X.J.M. Leijtens, H.P.A. van den Boom, E.J.M. Verdurmen, J. Molina Vazquez
Place of Publication	Eindhoven
Publisher	IEEE
Pages	113-116
Number of pages	4
ISBN (Print)	978-90-6144-989-8
Publication status	Published - 30 Nov 2006
Event	11th Annual Symposium IEEE/LEOS Benelux Chapter 2006 - Eindhoven, The Netherlands, Eindhoven, Netherlands Duration: 30 Nov 2006 → 1 Dec 2006 Conference number: 11

Publication series

Name
Publisher	IEEE LEOS Benelux Chapter
Number	06CH37725

Conference

Conference	11th Annual Symposium IEEE/LEOS Benelux Chapter 2006
Country/Territory	Netherlands
City	Eindhoven
Period	30/11/06 → 1/12/06

Keywords

IOMS-APD: Advanced Photonic Devices
METIS-237728
EWI-8442
IR-66701

Access to Document

Cite this

@inproceedings{5405adfee60d4b079daa88d32b6bb292,

title = "AL2O3 and Y2O3 Thin Films for Active Integrated Optical Waveguide Devices",

abstract = "\$Al\_\{2\}O\_\{3\}\$ and \$Y\_\{2\}O\_\{3\}\$ are both very promising host materials for active integrated optics applications such as rare-earth ion doped waveguide lasers. In this paper, a reactive co-sputtering process for stable, target condition-independent deposition of \$Al\_\{2\}O\_\{3\}\$ layers with high optical quality is discussed. The loss of as-deposited \$Al\_\{2\}O\_\{3\}\$ waveguides in the near infrared wavelength range was 0.3 dB/cm. Reactive ion etching of both \$Al\_\{3\}O\_\{2\}\$ and \$Y\_\{2\}O\_\{3\}\$ thin films for defining channel waveguide structures was investigated and compared using \$CF\_\{4\}/O\_\{2\}, BCl\_\{3\}, HBr\$ and \$CL\_\{2\}\$ inductively coupled plasmas.",

keywords = "IOMS-APD: Advanced Photonic Devices, METIS-237728, EWI-8442, IR-66701",

author = "J. Bradley and F. Ay and Kerstin Worhoff and Markus Pollnau",

year = "2006",

month = nov,

day = "30",

language = "Undefined",

isbn = "978-90-6144-989-8",

publisher = "IEEE",

number = "06CH37725",

pages = "113--116",

editor = "A.M.J. Koonen and X.J.M. Leijtens and \{van den Boom\}, H.P.A. and E.J.M. Verdurmen and \{Molina Vazquez\}, J.",

booktitle = "11th Annual Symposium IEEE/LEOS Benelux",

address = "United States",

note = "11th Annual Symposium IEEE/LEOS Benelux Chapter 2006 ; Conference date: 30-11-2006 Through 01-12-2006",

}

AL₂O₃ and Y₂O₃ Thin Films for Active Integrated Optical Waveguide Devices. / Bradley, J.; Ay, F.; Worhoff, Kerstin et al.
11th Annual Symposium IEEE/LEOS Benelux. ed. / A.M.J. Koonen; X.J.M. Leijtens; H.P.A. van den Boom; E.J.M. Verdurmen; J. Molina Vazquez. Eindhoven: IEEE, 2006. p. 113-116.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - AL2O3 and Y2O3 Thin Films for Active Integrated Optical Waveguide Devices

AU - Bradley, J.

AU - Ay, F.

AU - Worhoff, Kerstin

AU - Pollnau, Markus

N1 - Conference code: 11

PY - 2006/11/30

Y1 - 2006/11/30

N2 - $Al_{2}O_{3}$ and $Y_{2}O_{3}$ are both very promising host materials for active integrated optics applications such as rare-earth ion doped waveguide lasers. In this paper, a reactive co-sputtering process for stable, target condition-independent deposition of $Al_{2}O_{3}$ layers with high optical quality is discussed. The loss of as-deposited $Al_{2}O_{3}$ waveguides in the near infrared wavelength range was 0.3 dB/cm. Reactive ion etching of both $Al_{3}O_{2}$ and $Y_{2}O_{3}$ thin films for defining channel waveguide structures was investigated and compared using $CF_{4}/O_{2}, BCl_{3}, HBr$ and $CL_{2}$ inductively coupled plasmas.

AB - $Al_{2}O_{3}$ and $Y_{2}O_{3}$ are both very promising host materials for active integrated optics applications such as rare-earth ion doped waveguide lasers. In this paper, a reactive co-sputtering process for stable, target condition-independent deposition of $Al_{2}O_{3}$ layers with high optical quality is discussed. The loss of as-deposited $Al_{2}O_{3}$ waveguides in the near infrared wavelength range was 0.3 dB/cm. Reactive ion etching of both $Al_{3}O_{2}$ and $Y_{2}O_{3}$ thin films for defining channel waveguide structures was investigated and compared using $CF_{4}/O_{2}, BCl_{3}, HBr$ and $CL_{2}$ inductively coupled plasmas.

KW - IOMS-APD: Advanced Photonic Devices

KW - METIS-237728

KW - EWI-8442

KW - IR-66701

M3 - Conference contribution

SN - 978-90-6144-989-8

SP - 113

EP - 116

BT - 11th Annual Symposium IEEE/LEOS Benelux

A2 - Koonen, A.M.J.

A2 - Leijtens, X.J.M.

A2 - van den Boom, H.P.A.

A2 - Verdurmen, E.J.M.

A2 - Molina Vazquez, J.

PB - IEEE

CY - Eindhoven

T2 - 11th Annual Symposium IEEE/LEOS Benelux Chapter 2006

Y2 - 30 November 2006 through 1 December 2006

ER -