An Area-Correction Model for Accurate Extraction of Low Specific Contact Resistance

    Research output: Contribution to journalArticleAcademicpeer-review

    2 Citations (Scopus)

    Abstract

    The parasitic factors that strongly influence the measurement accuracy of cross-bridge Kelvin resistors have been extensively discussed during the last few decades. The minimum value of specific contact resistance that can be accurately extracted has been estimated. In this paper, we present an analytical model to account for the actual current flow across the contact and propose an area-correction method for a reliable extraction of specific contact resistance. The model is experimentally verified for low-resistivity (close-to-ideal) metal-to-metal contacts. The minimum contact resistance is determined by the dimensions of the two-metal stack in the area of contact and sheet resistances of the metals used.
    Original languageEnglish
    Pages (from-to)426-432
    Number of pages7
    JournalIEEE transactions on electron devices
    Volume59
    Issue number2
    DOIs
    Publication statusPublished - 1 Feb 2012

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    Contact resistance
    Metals
    Sheet resistance
    Resistors
    Analytical models

    Keywords

    • Specific contact resistance
    • Cross Bridge Kelvin Resistor(CBKR)

    Cite this

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    title = "An Area-Correction Model for Accurate Extraction of Low Specific Contact Resistance",
    abstract = "The parasitic factors that strongly influence the measurement accuracy of cross-bridge Kelvin resistors have been extensively discussed during the last few decades. The minimum value of specific contact resistance that can be accurately extracted has been estimated. In this paper, we present an analytical model to account for the actual current flow across the contact and propose an area-correction method for a reliable extraction of specific contact resistance. The model is experimentally verified for low-resistivity (close-to-ideal) metal-to-metal contacts. The minimum contact resistance is determined by the dimensions of the two-metal stack in the area of contact and sheet resistances of the metals used.",
    keywords = "Specific contact resistance, Cross Bridge Kelvin Resistor(CBKR)",
    author = "Kovalgin, {Alexeij Y.} and Natalie Tiggelman and Wolters, {Rob A.M.}",
    year = "2012",
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    An Area-Correction Model for Accurate Extraction of Low Specific Contact Resistance. / Kovalgin, Alexeij Y.; Tiggelman, Natalie; Wolters, Rob A.M.

    In: IEEE transactions on electron devices, Vol. 59, No. 2, 01.02.2012, p. 426-432.

    Research output: Contribution to journalArticleAcademicpeer-review

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    T1 - An Area-Correction Model for Accurate Extraction of Low Specific Contact Resistance

    AU - Kovalgin, Alexeij Y.

    AU - Tiggelman, Natalie

    AU - Wolters, Rob A.M.

    PY - 2012/2/1

    Y1 - 2012/2/1

    N2 - The parasitic factors that strongly influence the measurement accuracy of cross-bridge Kelvin resistors have been extensively discussed during the last few decades. The minimum value of specific contact resistance that can be accurately extracted has been estimated. In this paper, we present an analytical model to account for the actual current flow across the contact and propose an area-correction method for a reliable extraction of specific contact resistance. The model is experimentally verified for low-resistivity (close-to-ideal) metal-to-metal contacts. The minimum contact resistance is determined by the dimensions of the two-metal stack in the area of contact and sheet resistances of the metals used.

    AB - The parasitic factors that strongly influence the measurement accuracy of cross-bridge Kelvin resistors have been extensively discussed during the last few decades. The minimum value of specific contact resistance that can be accurately extracted has been estimated. In this paper, we present an analytical model to account for the actual current flow across the contact and propose an area-correction method for a reliable extraction of specific contact resistance. The model is experimentally verified for low-resistivity (close-to-ideal) metal-to-metal contacts. The minimum contact resistance is determined by the dimensions of the two-metal stack in the area of contact and sheet resistances of the metals used.

    KW - Specific contact resistance

    KW - Cross Bridge Kelvin Resistor(CBKR)

    U2 - 10.1109/TED.2011.2174365

    DO - 10.1109/TED.2011.2174365

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    JO - IEEE transactions on electron devices

    JF - IEEE transactions on electron devices

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