An Area-Correction Model for Accurate Extraction of Low Specific Contact Resistance

Alexeij Y. Kovalgin, Natalie Tiggelman, Rob A.M. Wolters

    Research output: Contribution to journalArticleAcademicpeer-review

    3 Citations (Scopus)
    6 Downloads (Pure)

    Abstract

    The parasitic factors that strongly influence the measurement accuracy of cross-bridge Kelvin resistors have been extensively discussed during the last few decades. The minimum value of specific contact resistance that can be accurately extracted has been estimated. In this paper, we present an analytical model to account for the actual current flow across the contact and propose an area-correction method for a reliable extraction of specific contact resistance. The model is experimentally verified for low-resistivity (close-to-ideal) metal-to-metal contacts. The minimum contact resistance is determined by the dimensions of the two-metal stack in the area of contact and sheet resistances of the metals used.
    Original languageEnglish
    Pages (from-to)426-432
    Number of pages7
    JournalIEEE Transactions on Electron Devices
    Volume59
    Issue number2
    DOIs
    Publication statusPublished - 1 Feb 2012

    Keywords

    • Specific contact resistance
    • Cross Bridge Kelvin Resistor(CBKR)

    Fingerprint

    Dive into the research topics of 'An Area-Correction Model for Accurate Extraction of Low Specific Contact Resistance'. Together they form a unique fingerprint.

    Cite this