Abstract
| Original language | English |
|---|---|
| Title of host publication | Advances in Biometrics |
| Subtitle of host publication | Third International Conference, ICB 2009, Alghero, Italy, June 2-5, 2009. Proceedings |
| Place of Publication | Berlin / Heidelberg |
| Publisher | Springer |
| Pages | 189-198 |
| Number of pages | 10 |
| ISBN (Print) | 978-3-642-01792-6 |
| DOIs | |
| Publication status | Published - Jun 2009 |
| Event | 3rd IAPR International Conference on Biometrics, ICB 2009 - University of Sassari, Alghero, Italy Duration: 2 Jun 2009 → 5 Jun 2009 Conference number: 3 |
Publication series
| Name | Lecture Notes in Computer Science |
|---|---|
| Publisher | Springer |
| Volume | 5558 |
| ISSN (Print) | 0302-9743 |
| ISSN (Electronic) | 1611-3349 |
Conference
| Conference | 3rd IAPR International Conference on Biometrics, ICB 2009 |
|---|---|
| Abbreviated title | ICB |
| Country | Italy |
| City | Alghero |
| Period | 2/06/09 → 5/06/09 |
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Keywords
- METIS-263916
- Marcenko Pastur equation
- IR-67802
- EWI-15687
- Face Recognition
- SCS-Safety
- Eigenvalue correction
Cite this
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Analysis of eigenvalue correction applied to biometrics. / Hendrikse, Anne; Veldhuis, Raymond; Spreeuwers, Luuk; Bazen, Asker.
Advances in Biometrics: Third International Conference, ICB 2009, Alghero, Italy, June 2-5, 2009. Proceedings. Berlin / Heidelberg : Springer, 2009. p. 189-198 (Lecture Notes in Computer Science; Vol. 5558).Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review
TY - GEN
T1 - Analysis of eigenvalue correction applied to biometrics
AU - Hendrikse, Anne
AU - Veldhuis, Raymond
AU - Spreeuwers, Luuk
AU - Bazen, Asker
N1 - 10.1007/978-3-642-01793-3_20
PY - 2009/6
Y1 - 2009/6
N2 - Eigenvalue estimation plays an important role in biometrics. However, if the number of samples is limited, estimates are significantly biased. In this article we analyse the influence of this bias on the error rates of PCA/LDA based verification systems, using both synthetic data with realistic parameters and real biometric data. Results of bias correction in the verification systems differ considerable between synthetic data and real data: while the bias is responsible for a large part of classification errors in the synthetic facial data, compensation of the bias in real facial data leads only to marginal improvements.
AB - Eigenvalue estimation plays an important role in biometrics. However, if the number of samples is limited, estimates are significantly biased. In this article we analyse the influence of this bias on the error rates of PCA/LDA based verification systems, using both synthetic data with realistic parameters and real biometric data. Results of bias correction in the verification systems differ considerable between synthetic data and real data: while the bias is responsible for a large part of classification errors in the synthetic facial data, compensation of the bias in real facial data leads only to marginal improvements.
KW - METIS-263916
KW - Marcenko Pastur equation
KW - IR-67802
KW - EWI-15687
KW - Face Recognition
KW - SCS-Safety
KW - Eigenvalue correction
U2 - 10.1007/978-3-642-01793-3_20
DO - 10.1007/978-3-642-01793-3_20
M3 - Conference contribution
SN - 978-3-642-01792-6
T3 - Lecture Notes in Computer Science
SP - 189
EP - 198
BT - Advances in Biometrics
PB - Springer
CY - Berlin / Heidelberg
ER -