Analysis of eigenvalue correction applied to biometrics

Anne Hendrikse, Raymond Veldhuis, Luuk Spreeuwers, Asker Bazen

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

3 Citations (Scopus)
36 Downloads (Pure)

Abstract

Eigenvalue estimation plays an important role in biometrics. However, if the number of samples is limited, estimates are significantly biased. In this article we analyse the influence of this bias on the error rates of PCA/LDA based verification systems, using both synthetic data with realistic parameters and real biometric data. Results of bias correction in the verification systems differ considerable between synthetic data and real data: while the bias is responsible for a large part of classification errors in the synthetic facial data, compensation of the bias in real facial data leads only to marginal improvements.
Original languageEnglish
Title of host publicationAdvances in Biometrics
Subtitle of host publicationThird International Conference, ICB 2009, Alghero, Italy, June 2-5, 2009. Proceedings
Place of PublicationBerlin / Heidelberg
PublisherSpringer
Pages189-198
Number of pages10
ISBN (Print)978-3-642-01792-6
DOIs
Publication statusPublished - Jun 2009
Event3rd IAPR International Conference on Biometrics, ICB 2009 - University of Sassari, Alghero, Italy
Duration: 2 Jun 20095 Jun 2009
Conference number: 3

Publication series

NameLecture Notes in Computer Science
PublisherSpringer
Volume5558
ISSN (Print)0302-9743
ISSN (Electronic)1611-3349

Conference

Conference3rd IAPR International Conference on Biometrics, ICB 2009
Abbreviated titleICB
CountryItaly
CityAlghero
Period2/06/095/06/09

Fingerprint

biometry
eigenvalue
analysis

Keywords

  • METIS-263916
  • Marcenko Pastur equation
  • IR-67802
  • EWI-15687
  • Face Recognition
  • SCS-Safety
  • Eigenvalue correction

Cite this

Hendrikse, A., Veldhuis, R., Spreeuwers, L., & Bazen, A. (2009). Analysis of eigenvalue correction applied to biometrics. In Advances in Biometrics: Third International Conference, ICB 2009, Alghero, Italy, June 2-5, 2009. Proceedings (pp. 189-198). (Lecture Notes in Computer Science; Vol. 5558). Berlin / Heidelberg: Springer. https://doi.org/10.1007/978-3-642-01793-3_20
Hendrikse, Anne ; Veldhuis, Raymond ; Spreeuwers, Luuk ; Bazen, Asker. / Analysis of eigenvalue correction applied to biometrics. Advances in Biometrics: Third International Conference, ICB 2009, Alghero, Italy, June 2-5, 2009. Proceedings. Berlin / Heidelberg : Springer, 2009. pp. 189-198 (Lecture Notes in Computer Science).
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abstract = "Eigenvalue estimation plays an important role in biometrics. However, if the number of samples is limited, estimates are significantly biased. In this article we analyse the influence of this bias on the error rates of PCA/LDA based verification systems, using both synthetic data with realistic parameters and real biometric data. Results of bias correction in the verification systems differ considerable between synthetic data and real data: while the bias is responsible for a large part of classification errors in the synthetic facial data, compensation of the bias in real facial data leads only to marginal improvements.",
keywords = "METIS-263916, Marcenko Pastur equation, IR-67802, EWI-15687, Face Recognition, SCS-Safety, Eigenvalue correction",
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Hendrikse, A, Veldhuis, R, Spreeuwers, L & Bazen, A 2009, Analysis of eigenvalue correction applied to biometrics. in Advances in Biometrics: Third International Conference, ICB 2009, Alghero, Italy, June 2-5, 2009. Proceedings. Lecture Notes in Computer Science, vol. 5558, Springer, Berlin / Heidelberg, pp. 189-198, 3rd IAPR International Conference on Biometrics, ICB 2009, Alghero, Italy, 2/06/09. https://doi.org/10.1007/978-3-642-01793-3_20

Analysis of eigenvalue correction applied to biometrics. / Hendrikse, Anne; Veldhuis, Raymond; Spreeuwers, Luuk; Bazen, Asker.

Advances in Biometrics: Third International Conference, ICB 2009, Alghero, Italy, June 2-5, 2009. Proceedings. Berlin / Heidelberg : Springer, 2009. p. 189-198 (Lecture Notes in Computer Science; Vol. 5558).

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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AB - Eigenvalue estimation plays an important role in biometrics. However, if the number of samples is limited, estimates are significantly biased. In this article we analyse the influence of this bias on the error rates of PCA/LDA based verification systems, using both synthetic data with realistic parameters and real biometric data. Results of bias correction in the verification systems differ considerable between synthetic data and real data: while the bias is responsible for a large part of classification errors in the synthetic facial data, compensation of the bias in real facial data leads only to marginal improvements.

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Hendrikse A, Veldhuis R, Spreeuwers L, Bazen A. Analysis of eigenvalue correction applied to biometrics. In Advances in Biometrics: Third International Conference, ICB 2009, Alghero, Italy, June 2-5, 2009. Proceedings. Berlin / Heidelberg: Springer. 2009. p. 189-198. (Lecture Notes in Computer Science). https://doi.org/10.1007/978-3-642-01793-3_20