Analysis of eigenvalue correction applied to biometrics

Anne Hendrikse; Raymond Veldhuis; Luuk Spreeuwers; Asker Bazen

doi:10.1007/978-3-642-01793-3_20

Analysis of eigenvalue correction applied to biometrics

Anne Hendrikse, Raymond Veldhuis, Luuk Spreeuwers, Asker Bazen

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

3 Citations (Scopus)

115 Downloads (Pure)

Abstract

Eigenvalue estimation plays an important role in biometrics. However, if the number of samples is limited, estimates are significantly biased. In this article we analyse the influence of this bias on the error rates of PCA/LDA based verification systems, using both synthetic data with realistic parameters and real biometric data. Results of bias correction in the verification systems differ considerable between synthetic data and real data: while the bias is responsible for a large part of classification errors in the synthetic facial data, compensation of the bias in real facial data leads only to marginal improvements.

Original language	English
Title of host publication	Advances in Biometrics
Subtitle of host publication	Third International Conference, ICB 2009, Alghero, Italy, June 2-5, 2009. Proceedings
Place of Publication	Berlin / Heidelberg
Publisher	Springer
Pages	189-198
Number of pages	10
ISBN (Print)	978-3-642-01792-6
DOIs	https://doi.org/10.1007/978-3-642-01793-3_20
Publication status	Published - Jun 2009
Event	3rd IAPR International Conference on Biometrics, ICB 2009 - University of Sassari, Alghero, Italy Duration: 2 Jun 2009 → 5 Jun 2009 Conference number: 3

Publication series

Name	Lecture Notes in Computer Science
Publisher	Springer
Volume	5558
ISSN (Print)	0302-9743
ISSN (Electronic)	1611-3349

Conference

Conference	3rd IAPR International Conference on Biometrics, ICB 2009
Abbreviated title	ICB
Country/Territory	Italy
City	Alghero
Period	2/06/09 → 5/06/09

Keywords

METIS-263916
Marcenko Pastur equation
IR-67802
EWI-15687
Face Recognition
SCS-Safety
Eigenvalue correction

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10.1007/978-3-642-01793-3_20

Hendrikse2009analysisAccepted author version, 309 KB

Cite this

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title = "Analysis of eigenvalue correction applied to biometrics",

abstract = "Eigenvalue estimation plays an important role in biometrics. However, if the number of samples is limited, estimates are significantly biased. In this article we analyse the influence of this bias on the error rates of PCA/LDA based verification systems, using both synthetic data with realistic parameters and real biometric data. Results of bias correction in the verification systems differ considerable between synthetic data and real data: while the bias is responsible for a large part of classification errors in the synthetic facial data, compensation of the bias in real facial data leads only to marginal improvements.",

keywords = "METIS-263916, Marcenko Pastur equation, IR-67802, EWI-15687, Face Recognition, SCS-Safety, Eigenvalue correction",

author = "Anne Hendrikse and Raymond Veldhuis and Luuk Spreeuwers and Asker Bazen",

note = "10.1007/978-3-642-01793-3_20 ; 3rd IAPR International Conference on Biometrics, ICB 2009, ICB ; Conference date: 02-06-2009 Through 05-06-2009",

year = "2009",

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doi = "10.1007/978-3-642-01793-3_20",

language = "English",

isbn = "978-3-642-01792-6",

series = "Lecture Notes in Computer Science",

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booktitle = "Advances in Biometrics",

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Hendrikse, A, Veldhuis, R , Spreeuwers, L & Bazen, A 2009, Analysis of eigenvalue correction applied to biometrics. in Advances in Biometrics: Third International Conference, ICB 2009, Alghero, Italy, June 2-5, 2009. Proceedings. Lecture Notes in Computer Science, vol. 5558, Springer, Berlin / Heidelberg, pp. 189-198, 3rd IAPR International Conference on Biometrics, ICB 2009, Alghero, Italy, 2/06/09. https://doi.org/10.1007/978-3-642-01793-3_20

Analysis of eigenvalue correction applied to biometrics. / Hendrikse, Anne; Veldhuis, Raymond ; Spreeuwers, Luuk et al.
Advances in Biometrics: Third International Conference, ICB 2009, Alghero, Italy, June 2-5, 2009. Proceedings. Berlin / Heidelberg: Springer, 2009. p. 189-198 (Lecture Notes in Computer Science; Vol. 5558).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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AU - Veldhuis, Raymond

AU - Spreeuwers, Luuk

AU - Bazen, Asker

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PY - 2009/6

Y1 - 2009/6

N2 - Eigenvalue estimation plays an important role in biometrics. However, if the number of samples is limited, estimates are significantly biased. In this article we analyse the influence of this bias on the error rates of PCA/LDA based verification systems, using both synthetic data with realistic parameters and real biometric data. Results of bias correction in the verification systems differ considerable between synthetic data and real data: while the bias is responsible for a large part of classification errors in the synthetic facial data, compensation of the bias in real facial data leads only to marginal improvements.

AB - Eigenvalue estimation plays an important role in biometrics. However, if the number of samples is limited, estimates are significantly biased. In this article we analyse the influence of this bias on the error rates of PCA/LDA based verification systems, using both synthetic data with realistic parameters and real biometric data. Results of bias correction in the verification systems differ considerable between synthetic data and real data: while the bias is responsible for a large part of classification errors in the synthetic facial data, compensation of the bias in real facial data leads only to marginal improvements.

KW - METIS-263916

KW - Marcenko Pastur equation

KW - IR-67802

KW - EWI-15687

KW - Face Recognition

KW - SCS-Safety

KW - Eigenvalue correction

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M3 - Conference contribution

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CY - Berlin / Heidelberg

T2 - 3rd IAPR International Conference on Biometrics, ICB 2009

Y2 - 2 June 2009 through 5 June 2009

ER -

Analysis of eigenvalue correction applied to biometrics

Abstract

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Keywords

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