Analysis Of Micromachined Capacitive Incremental Position Sensor

A.A. Kuijpers, G.J.M. Krijnen, R.J. Wiegerink, T.S.J. Lammerink, M. Elwenspoek

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    This article presents an analysis for two related concepts of a capacitive incremental position sensor. In Incremental Capacitance Measurement Mode the periodic change in capacitance is measured to determine the relative displacement between two periodic geometries S1 and S2 with gap-distance of ~ 1 μm. In Constant Capacitance Measurement Mode the distance between S1 and S2 is controlled to keep the capacitance between S1 and S2 constant. Analysis and 2D- Finite Element simulations show that SNR for CCMM can be >300x over ICMM and with a lower non-linearity in the position sensor signal, CCMM will perform better in accurate quadrature position detection.
    Original languageEnglish
    Title of host publication16th MicroMechanics European Workshop
    Place of PublicationAmsterdam
    Number of pages4
    ISBN (Print)978-0-4445-1037-2
    Publication statusPublished - 2005
    Event16th MicroMechanics Europe Workshop, MME 2005 - Göteborg, Sweden
    Duration: 4 Sept 20056 Sept 2005
    Conference number: 16


    Workshop16th MicroMechanics Europe Workshop, MME 2005
    Abbreviated titleMME


    • Micro machining
    • EWI-19594
    • nano positioning
    • Capacitive position sensor


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