Analysis Of Micromachined Capacitive Incremental Position Sensor

A.A. Kuijpers, G.J.M. Krijnen, R.J. Wiegerink, T.S.J. Lammerink, M. Elwenspoek

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    Abstract

    This article presents an analysis for two related concepts of a capacitive incremental position sensor. In Incremental Capacitance Measurement Mode the periodic change in capacitance is measured to determine the relative displacement between two periodic geometries S1 and S2 with gap-distance of ~ 1 μm. In Constant Capacitance Measurement Mode the distance between S1 and S2 is controlled to keep the capacitance between S1 and S2 constant. Analysis and 2D- Finite Element simulations show that SNR for CCMM can be >300x over ICMM and with a lower non-linearity in the position sensor signal, CCMM will perform better in accurate quadrature position detection.
    Original languageEnglish
    Title of host publication16th MicroMechanics European Workshop
    Place of PublicationAmsterdam
    PublisherElsevier
    Pages1-4
    Number of pages4
    ISBN (Print)978-0-4445-1037-2
    Publication statusPublished - 2005
    Event16th MicroMechanics Europe Workshop, MME 2005 - Göteborg, Sweden
    Duration: 4 Sep 20056 Sep 2005
    Conference number: 16

    Workshop

    Workshop16th MicroMechanics Europe Workshop, MME 2005
    Abbreviated titleMME
    CountrySweden
    CityGöteborg
    Period4/09/056/09/05

    Keywords

    • Micro machining
    • EWI-19594
    • nano positioning
    • Capacitive position sensor

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