Analysis Of Micromachined Capacitive Incremental Position Sensor

A.A. Kuijpers; G.J.M. Krijnen; R.J. Wiegerink; T.S.J. Lammerink; M. Elwenspoek

Analysis Of Micromachined Capacitive Incremental Position Sensor

A.A. Kuijpers
, G.J.M. Krijnen
, R.J. Wiegerink
, T.S.J. Lammerink
, M. Elwenspoek

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

This article presents an analysis for two related concepts of a capacitive incremental position sensor. In Incremental Capacitance Measurement Mode the periodic change in capacitance is measured to determine the relative displacement between two periodic geometries S1 and S2 with gap-distance of ~ 1 μm. In Constant Capacitance Measurement Mode the distance between S1 and S2 is controlled to keep the capacitance between S1 and S2 constant. Analysis and 2D- Finite Element simulations show that SNR for CCMM can be >300x over ICMM and with a lower non-linearity in the position sensor signal, CCMM will perform better in accurate quadrature position detection.

Original language	English
Title of host publication	16th MicroMechanics European Workshop
Place of Publication	Amsterdam
Publisher	Elsevier
Pages	1-4
Number of pages	4
ISBN (Print)	978-0-4445-1037-2
Publication status	Published - 2005
Event	16th MicroMechanics Europe Workshop, MME 2005 - Göteborg, Sweden Duration: 4 Sept 2005 → 6 Sept 2005 Conference number: 16

Workshop

Workshop	16th MicroMechanics Europe Workshop, MME 2005
Abbreviated title	MME
Country/Territory	Sweden
City	Göteborg
Period	4/09/05 → 6/09/05

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

Keywords

Micro machining
EWI-19594
nano positioning
Capacitive position sensor

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@inproceedings{969ca9ab312b4aa6a7d2d7cbe4a02bcb,

title = "Analysis Of Micromachined Capacitive Incremental Position Sensor",

abstract = "This article presents an analysis for two related concepts of a capacitive incremental position sensor. In Incremental Capacitance Measurement Mode the periodic change in capacitance is measured to determine the relative displacement between two periodic geometries S1 and S2 with gap-distance of \textasciitilde{} 1 μm. In Constant Capacitance Measurement Mode the distance between S1 and S2 is controlled to keep the capacitance between S1 and S2 constant. Analysis and 2D- Finite Element simulations show that SNR for CCMM can be >300x over ICMM and with a lower non-linearity in the position sensor signal, CCMM will perform better in accurate quadrature position detection.",

keywords = "Micro machining, EWI-19594, nano positioning, Capacitive position sensor",

author = "A.A. Kuijpers and G.J.M. Krijnen and R.J. Wiegerink and T.S.J. Lammerink and M. Elwenspoek",

year = "2005",

language = "English",

isbn = "978-0-4445-1037-2",

pages = "1--4",

booktitle = "16th MicroMechanics European Workshop",

publisher = "Elsevier",

address = "Spain",

note = "16th MicroMechanics Europe Workshop, MME 2005, MME ; Conference date: 04-09-2005 Through 06-09-2005",

}

TY - GEN

T1 - Analysis Of Micromachined Capacitive Incremental Position Sensor

AU - Kuijpers, A.A.

AU - Krijnen, G.J.M.

AU - Wiegerink, R.J.

AU - Lammerink, T.S.J.

AU - Elwenspoek, M.

N1 - Conference code: 16

PY - 2005

Y1 - 2005

N2 - This article presents an analysis for two related concepts of a capacitive incremental position sensor. In Incremental Capacitance Measurement Mode the periodic change in capacitance is measured to determine the relative displacement between two periodic geometries S1 and S2 with gap-distance of ~ 1 μm. In Constant Capacitance Measurement Mode the distance between S1 and S2 is controlled to keep the capacitance between S1 and S2 constant. Analysis and 2D- Finite Element simulations show that SNR for CCMM can be >300x over ICMM and with a lower non-linearity in the position sensor signal, CCMM will perform better in accurate quadrature position detection.

AB - This article presents an analysis for two related concepts of a capacitive incremental position sensor. In Incremental Capacitance Measurement Mode the periodic change in capacitance is measured to determine the relative displacement between two periodic geometries S1 and S2 with gap-distance of ~ 1 μm. In Constant Capacitance Measurement Mode the distance between S1 and S2 is controlled to keep the capacitance between S1 and S2 constant. Analysis and 2D- Finite Element simulations show that SNR for CCMM can be >300x over ICMM and with a lower non-linearity in the position sensor signal, CCMM will perform better in accurate quadrature position detection.

KW - Micro machining

KW - EWI-19594

KW - nano positioning

KW - Capacitive position sensor

M3 - Conference contribution

SN - 978-0-4445-1037-2

SP - 1

EP - 4

BT - 16th MicroMechanics European Workshop

PB - Elsevier

CY - Amsterdam

T2 - 16th MicroMechanics Europe Workshop, MME 2005

Y2 - 4 September 2005 through 6 September 2005

ER -

Analysis Of Micromachined Capacitive Incremental Position Sensor

Abstract

Workshop

UN SDGs

Keywords

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