Angular distribution of titanium ions and neutrals in high-power impulse magnetron sputtering discharges

M. Renner, J. Fischer*, H. Hajihoseini, J. T. Gudmundsson, M. Rudolph, D. Lundin

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

7 Citations (Scopus)
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Abstract

The angular dependence of the deposition rates due to ions and neutrals in high-power impulse magnetron sputtering (HiPIMS) discharges with a titanium target were determined experimentally using a magnetically shielded and charge-selective quartz crystal microbalance (or ionmeter). These rates have been established as a function of the argon working gas pressure, the peak discharge current density, and the pulse length. For all explored cases, the total deposition rate exhibits a heart-shaped profile and the ionized flux fraction peaks on the discharge axis normal to the cathode target surface. This heart-shaped pattern is found to be amplified at increasing current densities and reduced at increased working gas pressures. Furthermore, it is confirmed that a low working gas pressure is beneficial for achieving high deposition rates and high ionized flux fractions in HiPIMS operation.

Original languageEnglish
Article number033009
Number of pages19
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume41
Issue number3
Early online date25 Apr 2023
DOIs
Publication statusPublished - May 2023

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