Anisotropic wet-chemical etching is a key technology in the fabrication of sensors and actuators because it is fast and cheap. However, the exact nature of the etching process is still unclear. A deeper understanding of the physical chemistry of the etch process is sought by investigating the thermodynamics and chemistry, the difference in underetch rate of apparently identical structures, typical surface structures and finally by computer simulation of the etch rate plot.
|Award date||18 Jan 2001|
|Place of Publication||Enschede|
|Print ISBNs||90 365 15351|
|Publication status||Published - 18 Jan 2001|