Antenna Ratio Power Law Dependence of Plasma Process-Induced Oxide Failure Fraction

Zhichun Wang, Cora Salm, F.G. Kuper, A. Scarpa

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationProceedings of SAFE conference 2000
    Place of PublicationVeldhoven, The Netherlands
    Pages-
    Number of pages3
    Publication statusPublished - 29 Nov 2000

    Keywords

    • METIS-113892

    Cite this

    Wang, Z., Salm, C., Kuper, F. G., & Scarpa, A. (2000). Antenna Ratio Power Law Dependence of Plasma Process-Induced Oxide Failure Fraction. In Proceedings of SAFE conference 2000 (pp. -). Veldhoven, The Netherlands.