Application of focused ion beam technology for photonic nanostructures

F. Ay; V.J. Gadgil; D. Geskus; S. Aravazhi; Kerstin Worhoff; Markus Pollnau

Application of focused ion beam technology for photonic nanostructures

F. Ay, V.J. Gadgil, D. Geskus, S. Aravazhi, Kerstin Worhoff, Markus Pollnau

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

Abstract

Al2O3 and KY(WO4)2 are promising materials for photonic applications with excellent optical properties and of interest for obtaining on chip resonator structures. However, there is no method available to fabricate these structures except FIB technology. We will discuss strategies to optimize the nano-structuring processes that are strongly dependent on the geometry of the desired structure. Furthermore, we will report our recent results on utilization and optimization of the focused ion beam technique for fabrication of nano-structures in integrated photonic devices on several material platforms such as amorphous Al2O3 and crystalline KY(WO4)2

Original language	Undefined
Title of host publication	Technical Proceedings of the 2011 NSTI Nanotechnology Conference & Expo - Nanotech 2011
Place of Publication	New York
Publisher	CRC Press
Pages	200-203
Number of pages	4
ISBN (Print)	978-1-4398-7139-3
Publication status	Published - Jun 2011
Event	2011 NSTI Nanotechnology Conference and Expo, Nanotech 2011 - Boston, United States Duration: 13 Jun 2011 → 16 Jun 2011 http://www.techconnectworld.com/Nanotech2011/

Publication series

Name
Publisher	CRC Press
Volume	2

Conference

Conference	2011 NSTI Nanotechnology Conference and Expo, Nanotech 2011
Abbreviated title	Nanotech
Country/Territory	United States
City	Boston
Period	13/06/11 → 16/06/11
Internet address	http://www.techconnectworld.com/Nanotech2011/

Keywords

IR-77677
METIS-279700
Gratings
EWI-20335
Optical waveguides
Photonics
IOMS-APD: Active Photonic Devices
Focused ion beam nanostructuring

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Cite this

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title = "Application of focused ion beam technology for photonic nanostructures",

abstract = "Al2O3 and KY(WO4)2 are promising materials for photonic applications with excellent optical properties and of interest for obtaining on chip resonator structures. However, there is no method available to fabricate these structures except FIB technology. We will discuss strategies to optimize the nano-structuring processes that are strongly dependent on the geometry of the desired structure. Furthermore, we will report our recent results on utilization and optimization of the focused ion beam technique for fabrication of nano-structures in integrated photonic devices on several material platforms such as amorphous Al2O3 and crystalline KY(WO4)2",

keywords = "IR-77677, METIS-279700, Gratings, EWI-20335, Optical waveguides, Photonics, IOMS-APD: Active Photonic Devices, Focused ion beam nanostructuring",

author = "F. Ay and V.J. Gadgil and D. Geskus and S. Aravazhi and Kerstin Worhoff and Markus Pollnau",

note = "eemcs-eprint-20335 ; null ; Conference date: 13-06-2011 Through 16-06-2011",

year = "2011",

month = jun,

language = "Undefined",

isbn = "978-1-4398-7139-3",

publisher = "CRC Press",

pages = "200--203",

booktitle = "Technical Proceedings of the 2011 NSTI Nanotechnology Conference & Expo - Nanotech 2011",

address = "United Kingdom",

url = "http://www.techconnectworld.com/Nanotech2011/",

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Ay, F, Gadgil, VJ, Geskus, D, Aravazhi, S, Worhoff, K & Pollnau, M 2011, Application of focused ion beam technology for photonic nanostructures. in Technical Proceedings of the 2011 NSTI Nanotechnology Conference & Expo - Nanotech 2011. CRC Press, New York, pp. 200-203, 2011 NSTI Nanotechnology Conference and Expo, Nanotech 2011, Boston, Massachusetts, United States, 13/06/11. <http://eprints.eemcs.utwente.nl/secure2/20335/01/817.pdf>

Application of focused ion beam technology for photonic nanostructures. / Ay, F.; Gadgil, V.J.; Geskus, D.; Aravazhi, S.; Worhoff, Kerstin; Pollnau, Markus.

Technical Proceedings of the 2011 NSTI Nanotechnology Conference & Expo - Nanotech 2011. New York : CRC Press, 2011. p. 200-203.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Application of focused ion beam technology for photonic nanostructures

AU - Ay, F.

AU - Gadgil, V.J.

AU - Geskus, D.

AU - Aravazhi, S.

AU - Worhoff, Kerstin

AU - Pollnau, Markus

N1 - eemcs-eprint-20335

PY - 2011/6

Y1 - 2011/6

N2 - Al2O3 and KY(WO4)2 are promising materials for photonic applications with excellent optical properties and of interest for obtaining on chip resonator structures. However, there is no method available to fabricate these structures except FIB technology. We will discuss strategies to optimize the nano-structuring processes that are strongly dependent on the geometry of the desired structure. Furthermore, we will report our recent results on utilization and optimization of the focused ion beam technique for fabrication of nano-structures in integrated photonic devices on several material platforms such as amorphous Al2O3 and crystalline KY(WO4)2

AB - Al2O3 and KY(WO4)2 are promising materials for photonic applications with excellent optical properties and of interest for obtaining on chip resonator structures. However, there is no method available to fabricate these structures except FIB technology. We will discuss strategies to optimize the nano-structuring processes that are strongly dependent on the geometry of the desired structure. Furthermore, we will report our recent results on utilization and optimization of the focused ion beam technique for fabrication of nano-structures in integrated photonic devices on several material platforms such as amorphous Al2O3 and crystalline KY(WO4)2

KW - IR-77677

KW - METIS-279700

KW - Gratings

KW - EWI-20335

KW - Optical waveguides

KW - Photonics

KW - IOMS-APD: Active Photonic Devices

KW - Focused ion beam nanostructuring

M3 - Conference contribution

SN - 978-1-4398-7139-3

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EP - 203

BT - Technical Proceedings of the 2011 NSTI Nanotechnology Conference & Expo - Nanotech 2011

PB - CRC Press

CY - New York

Y2 - 13 June 2011 through 16 June 2011

ER -