Application of focused ion beam technology for photonic nanostructures

F. Ay, V.J. Gadgil, D. Geskus, S. Aravazhi, Kerstin Worhoff, Markus Pollnau

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Abstract

    Al2O3 and KY(WO4)2 are promising materials for photonic applications with excellent optical properties and of interest for obtaining on chip resonator structures. However, there is no method available to fabricate these structures except FIB technology. We will discuss strategies to optimize the nano-structuring processes that are strongly dependent on the geometry of the desired structure. Furthermore, we will report our recent results on utilization and optimization of the focused ion beam technique for fabrication of nano-structures in integrated photonic devices on several material platforms such as amorphous Al2O3 and crystalline KY(WO4)2
    Original languageUndefined
    Title of host publicationTechnical Proceedings of the 2011 NSTI Nanotechnology Conference & Expo - Nanotech 2011
    Place of PublicationNew York
    PublisherCRC Press
    Pages200-203
    Number of pages4
    ISBN (Print)978-1-4398-7139-3
    Publication statusPublished - Jun 2011
    Event2011 NSTI Nanotechnology Conference and Expo, Nanotech 2011 - Boston, United States
    Duration: 13 Jun 201116 Jun 2011
    http://www.techconnectworld.com/Nanotech2011/

    Publication series

    Name
    PublisherCRC Press
    Volume2

    Conference

    Conference2011 NSTI Nanotechnology Conference and Expo, Nanotech 2011
    Abbreviated titleNanotech
    CountryUnited States
    CityBoston
    Period13/06/1116/06/11
    Internet address

    Keywords

    • IR-77677
    • METIS-279700
    • Gratings
    • EWI-20335
    • Optical waveguides
    • Photonics
    • IOMS-APD: Active Photonic Devices
    • Focused ion beam nanostructuring

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