Applications of fluorocarbon polymers in micromechanics and micromachining

H.V. Jansen, J.G.E. Gardeniers, J. Elders, H.A.C. Tilmans, M. Elwenspoek

Research output: Contribution to journalArticleAcademicpeer-review

63 Citations (Scopus)
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Abstract

Several thin-film deposition and etching techniques of the polymer fluorocarbon are investigated and the resulting thin-film properties will be compared with those of commercially available bulk polytetrafluoroethylene. The most promising deposition technique is performed in a conventional reactive ion etcher using a carbonhydrotrifluoride (CHF3) plasma. By changing the deposition parameters, control of the properties and step coverage of the deposited thin films within a certain range is possible, e.g., unidirectional and conformal step coverage of deposited thin films can be obtained. Etching is performed with the help of an evaporated aluminum oxide mask.
Original languageEnglish
Pages (from-to)136-140
Number of pages5
JournalSensors and actuators. A: Physical
Volume41
Issue number1-3
DOIs
Publication statusPublished - 1 Apr 1994

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