TY - JOUR
T1 - Applications of fluorocarbon polymers in micromechanics and micromachining
AU - Jansen, H.V.
AU - Gardeniers, J.G.E.
AU - Elders, J.
AU - Tilmans, H.A.C.
AU - Elwenspoek, M.
PY - 1994/4/1
Y1 - 1994/4/1
N2 - Several thin-film deposition and etching techniques of the polymer fluorocarbon are investigated and the resulting thin-film properties will be compared with those of commercially available bulk polytetrafluoroethylene. The most promising deposition technique is performed in a conventional reactive ion etcher using a carbonhydrotrifluoride (CHF3) plasma. By changing the deposition parameters, control of the properties and step coverage of the deposited thin films within a certain range is possible, e.g., unidirectional and conformal step coverage of deposited thin films can be obtained. Etching is performed with the help of an evaporated aluminum oxide mask.
AB - Several thin-film deposition and etching techniques of the polymer fluorocarbon are investigated and the resulting thin-film properties will be compared with those of commercially available bulk polytetrafluoroethylene. The most promising deposition technique is performed in a conventional reactive ion etcher using a carbonhydrotrifluoride (CHF3) plasma. By changing the deposition parameters, control of the properties and step coverage of the deposited thin films within a certain range is possible, e.g., unidirectional and conformal step coverage of deposited thin films can be obtained. Etching is performed with the help of an evaporated aluminum oxide mask.
U2 - 10.1016/0924-4247(94)80101-0
DO - 10.1016/0924-4247(94)80101-0
M3 - Article
SN - 0924-4247
VL - 41
SP - 136
EP - 140
JO - Sensors and Actuators A: Physical
JF - Sensors and Actuators A: Physical
IS - 1-3
ER -
