Applications of fluorocarbon polymers in micromechanics and micromachining

H.V. Jansen; J.G.E. Gardeniers; J. Elders; H.A.C. Tilmans; M. Elwenspoek

doi:10.1016/0924-4247(94)80101-0

Applications of fluorocarbon polymers in micromechanics and micromachining

H.V. Jansen
, J.G.E. Gardeniers
, J. Elders
, H.A.C. Tilmans
, M. Elwenspoek

Research output: Contribution to journal › Article › Academic › peer-review

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Abstract

Several thin-film deposition and etching techniques of the polymer fluorocarbon are investigated and the resulting thin-film properties will be compared with those of commercially available bulk polytetrafluoroethylene. The most promising deposition technique is performed in a conventional reactive ion etcher using a carbonhydrotrifluoride (CHF3) plasma. By changing the deposition parameters, control of the properties and step coverage of the deposited thin films within a certain range is possible, e.g., unidirectional and conformal step coverage of deposited thin films can be obtained. Etching is performed with the help of an evaporated aluminum oxide mask.

Original language	English
Pages (from-to)	136-140
Number of pages	5
Journal	Sensors and Actuators A: Physical
Volume	41
Issue number	1-3
DOIs	https://doi.org/10.1016/0924-4247(94)80101-0
Publication status	Published - 1 Apr 1994

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SDG 9 Industry, Innovation, and Infrastructure

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abstract = "Several thin-film deposition and etching techniques of the polymer fluorocarbon are investigated and the resulting thin-film properties will be compared with those of commercially available bulk polytetrafluoroethylene. The most promising deposition technique is performed in a conventional reactive ion etcher using a carbonhydrotrifluoride (CHF3) plasma. By changing the deposition parameters, control of the properties and step coverage of the deposited thin films within a certain range is possible, e.g., unidirectional and conformal step coverage of deposited thin films can be obtained. Etching is performed with the help of an evaporated aluminum oxide mask.",

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AU - Jansen, H.V.

AU - Gardeniers, J.G.E.

AU - Elders, J.

AU - Tilmans, H.A.C.

AU - Elwenspoek, M.

PY - 1994/4/1

Y1 - 1994/4/1

N2 - Several thin-film deposition and etching techniques of the polymer fluorocarbon are investigated and the resulting thin-film properties will be compared with those of commercially available bulk polytetrafluoroethylene. The most promising deposition technique is performed in a conventional reactive ion etcher using a carbonhydrotrifluoride (CHF3) plasma. By changing the deposition parameters, control of the properties and step coverage of the deposited thin films within a certain range is possible, e.g., unidirectional and conformal step coverage of deposited thin films can be obtained. Etching is performed with the help of an evaporated aluminum oxide mask.

AB - Several thin-film deposition and etching techniques of the polymer fluorocarbon are investigated and the resulting thin-film properties will be compared with those of commercially available bulk polytetrafluoroethylene. The most promising deposition technique is performed in a conventional reactive ion etcher using a carbonhydrotrifluoride (CHF3) plasma. By changing the deposition parameters, control of the properties and step coverage of the deposited thin films within a certain range is possible, e.g., unidirectional and conformal step coverage of deposited thin films can be obtained. Etching is performed with the help of an evaporated aluminum oxide mask.

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DO - 10.1016/0924-4247(94)80101-0

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JO - Sensors and Actuators A: Physical

JF - Sensors and Actuators A: Physical

IS - 1-3

ER -

Applications of fluorocarbon polymers in micromechanics and micromachining

Abstract

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