Aromatic structure degradation of single layer graphene on an amorphous silicon substrate in the presence of water, hydrogen and Extreme Ultraviolet light

Baibhav Kumar Mund* (Corresponding Author), J.M. Sturm, Christopher James Lee, Frederik Bijkerk

*Corresponding author for this work

Research output: Contribution to journalArticleAcademicpeer-review

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Abstract

In this paper we study the reaction of water and graphene under Extreme Ultraviolet (EUV) irradiation and in the presence of hydrogen. In this work, single layer graphene (SLG) on amorphous Si as an underlying substrate was dosed with water (0.75 ML) and exposed to EUV (λ = 13.5 nm, 92 eV) with partial pressures of H2 in the background. The results show that the aromatic structure of graphene, when exposed to EUV and H2, breaks down into aryl ketones and enols of 1,3 di-ketone. Infrared (IR) spectroscopy shows that SLG oxidizes, with increasing H2 pressure leading to the grain boundary edges of graphene forming ketones and carboxylic acids. In situ and post exposure analyses also reveal that EUV exposure reduces the sp2 content of the graphene layer, with the sp3 content increasing, resulting in a more defective graphene layer.
Original languageEnglish
Pages (from-to)1033-1040
Number of pages8
JournalApplied surface science
Volume427
Issue numberPart B
DOIs
Publication statusPublished - 1 Jan 2018

Fingerprint

Graphite
Amorphous silicon
Graphene
Hydrogen
Degradation
Water
Substrates
Ketones
Carboxylic Acids
Ultraviolet Rays
Carboxylic acids
Partial pressure
Infrared spectroscopy
Grain boundaries
Irradiation

Keywords

  • Single Layer Graphene
  • Reflection Absorption Infrared Spectroscopy
  • water
  • Temperature Programmed Desorption
  • Extreme Ultraviolet Light

Cite this

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title = "Aromatic structure degradation of single layer graphene on an amorphous silicon substrate in the presence of water, hydrogen and Extreme Ultraviolet light",
abstract = "In this paper we study the reaction of water and graphene under Extreme Ultraviolet (EUV) irradiation and in the presence of hydrogen. In this work, single layer graphene (SLG) on amorphous Si as an underlying substrate was dosed with water (0.75 ML) and exposed to EUV (λ = 13.5 nm, 92 eV) with partial pressures of H2 in the background. The results show that the aromatic structure of graphene, when exposed to EUV and H2, breaks down into aryl ketones and enols of 1,3 di-ketone. Infrared (IR) spectroscopy shows that SLG oxidizes, with increasing H2 pressure leading to the grain boundary edges of graphene forming ketones and carboxylic acids. In situ and post exposure analyses also reveal that EUV exposure reduces the sp2 content of the graphene layer, with the sp3 content increasing, resulting in a more defective graphene layer.",
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Aromatic structure degradation of single layer graphene on an amorphous silicon substrate in the presence of water, hydrogen and Extreme Ultraviolet light. / Mund, Baibhav Kumar (Corresponding Author); Sturm, J.M.; Lee, Christopher James; Bijkerk, Frederik .

In: Applied surface science, Vol. 427, No. Part B, 01.01.2018, p. 1033-1040.

Research output: Contribution to journalArticleAcademicpeer-review

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T1 - Aromatic structure degradation of single layer graphene on an amorphous silicon substrate in the presence of water, hydrogen and Extreme Ultraviolet light

AU - Mund, Baibhav Kumar

AU - Sturm, J.M.

AU - Lee, Christopher James

AU - Bijkerk, Frederik

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N2 - In this paper we study the reaction of water and graphene under Extreme Ultraviolet (EUV) irradiation and in the presence of hydrogen. In this work, single layer graphene (SLG) on amorphous Si as an underlying substrate was dosed with water (0.75 ML) and exposed to EUV (λ = 13.5 nm, 92 eV) with partial pressures of H2 in the background. The results show that the aromatic structure of graphene, when exposed to EUV and H2, breaks down into aryl ketones and enols of 1,3 di-ketone. Infrared (IR) spectroscopy shows that SLG oxidizes, with increasing H2 pressure leading to the grain boundary edges of graphene forming ketones and carboxylic acids. In situ and post exposure analyses also reveal that EUV exposure reduces the sp2 content of the graphene layer, with the sp3 content increasing, resulting in a more defective graphene layer.

AB - In this paper we study the reaction of water and graphene under Extreme Ultraviolet (EUV) irradiation and in the presence of hydrogen. In this work, single layer graphene (SLG) on amorphous Si as an underlying substrate was dosed with water (0.75 ML) and exposed to EUV (λ = 13.5 nm, 92 eV) with partial pressures of H2 in the background. The results show that the aromatic structure of graphene, when exposed to EUV and H2, breaks down into aryl ketones and enols of 1,3 di-ketone. Infrared (IR) spectroscopy shows that SLG oxidizes, with increasing H2 pressure leading to the grain boundary edges of graphene forming ketones and carboxylic acids. In situ and post exposure analyses also reveal that EUV exposure reduces the sp2 content of the graphene layer, with the sp3 content increasing, resulting in a more defective graphene layer.

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