Atmospheric-pressure atomic layer deposition: recent applications and new emerging applications in high-porosity/3D materials

M. Chen*, M. P. Nijboer, A. Y. Kovalgin, A. Nijmeijer, F. Roozeboom, M. W.J. Luiten-Olieman*

*Corresponding author for this work

Research output: Contribution to journalReview articleAcademicpeer-review

2 Citations (Scopus)
6 Downloads (Pure)

Abstract

Atomic layer deposition (ALD) is a widely recognized technique for depositing ultrathin conformal films with excellent thickness control at Ångström or (sub)monolayer level. Atmospheric-pressure ALD is an upcoming ALD process with a potentially lower ownership cost of the reactor. In this review, we provide a comprehensive overview of the recent applications and development of ALD approaches emphasizing those based on operation at atmospheric pressure. Each application determines its own specific reactor design. Spatial ALD (s-ALD) has been recently introduced for the commercial production of large-area 2D displays, the surface passivation and encapsulation of solar cells and organic light-emitting diode (OLED) displays. Atmospheric temporal ALD (t-ALD) has opened up new emerging applications such as high-porosity particle coatings, functionalization of capillary columns for gas chromatography, and membrane modification in water treatment and gas purification. The challenges and opportunities for highly conformal coating on porous substrates by atmospheric ALD have been identified. We discuss in particular the pros and cons of both s-ALD and t-ALD in combination with their reactor designs in relation to the coating of 3D and high-porosity materials.

Original languageEnglish
Pages (from-to)10254-10277
Number of pages24
JournalDalton transactions
Volume52
Issue number30
DOIs
Publication statusPublished - 20 Jun 2023

Keywords

  • UT-Hybrid-D

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