Atomic force microscopic studies on the growth of self-assembled monolayer on SrTiO3 surfaces

B.L. Kropman; David H.A. Blank; Horst Rogalla

doi:10.1016/S0040-6090(98)00625-7

Atomic force microscopic studies on the growth of self-assembled monolayer on SrTiO3 surfaces

B.L. Kropman, David H.A. Blank, Horst Rogalla

Research output: Contribution to journal › Article › Academic › peer-review

12 Citations (Scopus)

7 Downloads (Pure)

Abstract

The growth mechanism of octadecyltrichlorosilane (OTS) on SrTiO3 substrates has been investigated by wettability and force microscopy measurements. The films were formed by the self-assembly technique. It was found that growth proceeded via two types of islands: large `fractal-like' islands and smaller circular patches of molecules. The patches grow by attachment of monomers and coalescence with other islands. The overall growth mode obeyed first order Langmuir kinetics and is found to be similar to the growth of alkylsiloxanes on SiO2 and mica. The difference between growth on SrTiO3 and SrTiO3:Nb is that the growth rate is slower on the latter substrate.

Original language	Undefined
Pages (from-to)	185-190
Number of pages	6
Journal	Thin solid films
Volume	327
Issue number	1
DOIs	https://doi.org/10.1016/S0040-6090(98)00625-7
Publication status	Published - 1998

Keywords

IR-23570
METIS-128369
Octadecylchlorosilane
Self-Assembly
Atomic Force Microscopy

Access to Document

10.1016/S0040-6090(98)00625-7

Cite this

@article{edc480f749a14b20bdfcdb53e92d114f,

title = "Atomic force microscopic studies on the growth of self-assembled monolayer on SrTiO3 surfaces",

abstract = "The growth mechanism of octadecyltrichlorosilane (OTS) on SrTiO3 substrates has been investigated by wettability and force microscopy measurements. The films were formed by the self-assembly technique. It was found that growth proceeded via two types of islands: large `fractal-like' islands and smaller circular patches of molecules. The patches grow by attachment of monomers and coalescence with other islands. The overall growth mode obeyed first order Langmuir kinetics and is found to be similar to the growth of alkylsiloxanes on SiO2 and mica. The difference between growth on SrTiO3 and SrTiO3:Nb is that the growth rate is slower on the latter substrate.",

keywords = "IR-23570, METIS-128369, Octadecylchlorosilane, Self-Assembly, Atomic Force Microscopy",

author = "B.L. Kropman and Blank, {David H.A.} and Horst Rogalla",

year = "1998",

doi = "10.1016/S0040-6090(98)00625-7",

language = "Undefined",

volume = "327",

pages = "185--190",

journal = "Thin solid films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

number = "1",

}

TY - JOUR

T1 - Atomic force microscopic studies on the growth of self-assembled monolayer on SrTiO3 surfaces

AU - Kropman, B.L.

AU - Blank, David H.A.

AU - Rogalla, Horst

PY - 1998

Y1 - 1998

N2 - The growth mechanism of octadecyltrichlorosilane (OTS) on SrTiO3 substrates has been investigated by wettability and force microscopy measurements. The films were formed by the self-assembly technique. It was found that growth proceeded via two types of islands: large `fractal-like' islands and smaller circular patches of molecules. The patches grow by attachment of monomers and coalescence with other islands. The overall growth mode obeyed first order Langmuir kinetics and is found to be similar to the growth of alkylsiloxanes on SiO2 and mica. The difference between growth on SrTiO3 and SrTiO3:Nb is that the growth rate is slower on the latter substrate.

AB - The growth mechanism of octadecyltrichlorosilane (OTS) on SrTiO3 substrates has been investigated by wettability and force microscopy measurements. The films were formed by the self-assembly technique. It was found that growth proceeded via two types of islands: large `fractal-like' islands and smaller circular patches of molecules. The patches grow by attachment of monomers and coalescence with other islands. The overall growth mode obeyed first order Langmuir kinetics and is found to be similar to the growth of alkylsiloxanes on SiO2 and mica. The difference between growth on SrTiO3 and SrTiO3:Nb is that the growth rate is slower on the latter substrate.

KW - IR-23570

KW - METIS-128369

KW - Octadecylchlorosilane

KW - Self-Assembly

KW - Atomic Force Microscopy

U2 - 10.1016/S0040-6090(98)00625-7

DO - 10.1016/S0040-6090(98)00625-7

M3 - Article

SN - 0040-6090

VL - 327

SP - 185

EP - 190

JO - Thin solid films

JF - Thin solid films

IS - 1

ER -