Atomic force microscopic studies on the growth of self-assembled monolayer on SrTiO3 surfaces

B.L. Kropman, David H.A. Blank, Horst Rogalla

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Abstract

The growth mechanism of octadecyltrichlorosilane (OTS) on SrTiO3 substrates has been investigated by wettability and force microscopy measurements. The films were formed by the self-assembly technique. It was found that growth proceeded via two types of islands: large `fractal-like' islands and smaller circular patches of molecules. The patches grow by attachment of monomers and coalescence with other islands. The overall growth mode obeyed first order Langmuir kinetics and is found to be similar to the growth of alkylsiloxanes on SiO2 and mica. The difference between growth on SrTiO3 and SrTiO3:Nb is that the growth rate is slower on the latter substrate.
Original languageUndefined
Pages (from-to)185-190
Number of pages6
JournalThin solid films
Volume327
Issue number1
DOIs
Publication statusPublished - 1998

Keywords

  • IR-23570
  • METIS-128369
  • Octadecylchlorosilane
  • Self-Assembly
  • Atomic Force Microscopy

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