Atomic H diffusion and C etching in multilayer graphene monitored using a y based optical sensor

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Abstract

In this work, the authors expose transferred multilayer graphene on a yttrium based hydrogen sensor. Using spectroscopic ellipsometry, they show that graphene, as well as amorphous carbon reference films, reduce diffusion of hydrogen to the underlying Y layer. Graphene and C are both etched due to exposure to atomic H, eventually leading to hydrogenation of the Y to YH2 and YH3. Multilayer graphene, even with defects originating from manufacturing and transfer, showed a higher resistance against atomic H etching compared to amorphous carbon films of a similar thickness.

Original languageEnglish
Article number051801
Number of pages6
JournalJournal of Vacuum Science and Technology B: Nanotechnology and Microelectronics
Volume37
Issue number5
Early online date29 Jul 2019
DOIs
Publication statusPublished - 1 Sep 2019

Fingerprint

Graphite
Optical sensors
optical measuring instruments
Graphene
Etching
graphene
Multilayers
etching
Amorphous carbon
Hydrogen
Yttrium
Spectroscopic ellipsometry
carbon
Carbon films
high resistance
Amorphous films
hydrogen
yttrium
Hydrogenation
hydrogenation

Cite this

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abstract = "In this work, the authors expose transferred multilayer graphene on a yttrium based hydrogen sensor. Using spectroscopic ellipsometry, they show that graphene, as well as amorphous carbon reference films, reduce diffusion of hydrogen to the underlying Y layer. Graphene and C are both etched due to exposure to atomic H, eventually leading to hydrogenation of the Y to YH2 and YH3. Multilayer graphene, even with defects originating from manufacturing and transfer, showed a higher resistance against atomic H etching compared to amorphous carbon films of a similar thickness.",
author = "Mund, {Baibhav K.} and Olena Soroka and Sturm, {Jacobus M.} and {Van Den Beld}, {Wesley T.E.} and Lee, {Chris J.} and Fred Bijkerk",
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TY - JOUR

T1 - Atomic H diffusion and C etching in multilayer graphene monitored using a y based optical sensor

AU - Mund, Baibhav K.

AU - Soroka, Olena

AU - Sturm, Jacobus M.

AU - Van Den Beld, Wesley T.E.

AU - Lee, Chris J.

AU - Bijkerk, Fred

PY - 2019/9/1

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AB - In this work, the authors expose transferred multilayer graphene on a yttrium based hydrogen sensor. Using spectroscopic ellipsometry, they show that graphene, as well as amorphous carbon reference films, reduce diffusion of hydrogen to the underlying Y layer. Graphene and C are both etched due to exposure to atomic H, eventually leading to hydrogenation of the Y to YH2 and YH3. Multilayer graphene, even with defects originating from manufacturing and transfer, showed a higher resistance against atomic H etching compared to amorphous carbon films of a similar thickness.

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U2 - 10.1116/1.5110213

DO - 10.1116/1.5110213

M3 - Article

VL - 37

JO - Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

JF - Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

SN - 2166-2746

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