Atomic layer deposition of W1.5N barrier films for Cu Metallization

Svetlana Nikolajevna van Nieuwkasteele-Bystrova, Antonius A.I. Aarnink, J. Holleman, Robertus A.M. Wolters

Research output: Contribution to journalArticleAcademicpeer-review

33 Citations (Scopus)

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