Automatic kelvin probe compatible with ultrahigh vacuum

I.D. Baikie, Kees van der Werf, H. Oerbekke, J. Broeze, Arend van Silfhout

    Research output: Contribution to journalArticleAcademic

    37 Citations (Scopus)
    50 Downloads (Pure)

    Abstract

    This article describes a new type of in situ ultrahigh‐vacuum compatible kelvin probe based on a voice‐coil driving mechanism. This design exhibits several advantages over conventional mechanical feed‐through and (in situ) piezoelectric devices in regard to the possibility of multiple probe geometry, flexibility of probe geometry, amplitude of oscillation, and pure parallel vibration. Automatic setup and constant spacing features are achieved using a digital‐to‐analog converter (DAC) steered offset potential. The combination of very low driver noise pick‐up and data‐acquisition system (DAS) signal processing techniques results in a work function (wf  ) resolution, under optimal conditions, of <0.1 meV. Due to its high surface sensitivity and compatibility with standard sample cleaning and analysis techniques this design has numerous applications in surface studies, e.g., adsorption kinetics, sample topography and homogeneity, sputter profiles, etc. For semiconductor specimens the high wf resolution makes it eminently suitable for surface photovoltage (SPV) spectroscopy.
    Original languageUndefined
    Pages (from-to)930
    JournalReview of scientific instruments
    Volume60
    Issue number5
    DOIs
    Publication statusPublished - 1989

    Keywords

    • IR-73182

    Cite this

    Baikie, I. D., van der Werf, K., Oerbekke, H., Broeze, J., & van Silfhout, A. (1989). Automatic kelvin probe compatible with ultrahigh vacuum. Review of scientific instruments, 60(5), 930. https://doi.org/10.1063/1.1140346
    Baikie, I.D. ; van der Werf, Kees ; Oerbekke, H. ; Broeze, J. ; van Silfhout, Arend. / Automatic kelvin probe compatible with ultrahigh vacuum. In: Review of scientific instruments. 1989 ; Vol. 60, No. 5. pp. 930.
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    title = "Automatic kelvin probe compatible with ultrahigh vacuum",
    abstract = "This article describes a new type of in situ ultrahigh‐vacuum compatible kelvin probe based on a voice‐coil driving mechanism. This design exhibits several advantages over conventional mechanical feed‐through and (in situ) piezoelectric devices in regard to the possibility of multiple probe geometry, flexibility of probe geometry, amplitude of oscillation, and pure parallel vibration. Automatic setup and constant spacing features are achieved using a digital‐to‐analog converter (DAC) steered offset potential. The combination of very low driver noise pick‐up and data‐acquisition system (DAS) signal processing techniques results in a work function (wf  ) resolution, under optimal conditions, of <0.1 meV. Due to its high surface sensitivity and compatibility with standard sample cleaning and analysis techniques this design has numerous applications in surface studies, e.g., adsorption kinetics, sample topography and homogeneity, sputter profiles, etc. For semiconductor specimens the high wf resolution makes it eminently suitable for surface photovoltage (SPV) spectroscopy.",
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    author = "I.D. Baikie and {van der Werf}, Kees and H. Oerbekke and J. Broeze and {van Silfhout}, Arend",
    year = "1989",
    doi = "10.1063/1.1140346",
    language = "Undefined",
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    publisher = "American Institute of Physics",
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    Baikie, ID, van der Werf, K, Oerbekke, H, Broeze, J & van Silfhout, A 1989, 'Automatic kelvin probe compatible with ultrahigh vacuum' Review of scientific instruments, vol. 60, no. 5, pp. 930. https://doi.org/10.1063/1.1140346

    Automatic kelvin probe compatible with ultrahigh vacuum. / Baikie, I.D.; van der Werf, Kees; Oerbekke, H.; Broeze, J.; van Silfhout, Arend.

    In: Review of scientific instruments, Vol. 60, No. 5, 1989, p. 930.

    Research output: Contribution to journalArticleAcademic

    TY - JOUR

    T1 - Automatic kelvin probe compatible with ultrahigh vacuum

    AU - Baikie, I.D.

    AU - van der Werf, Kees

    AU - Oerbekke, H.

    AU - Broeze, J.

    AU - van Silfhout, Arend

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    AB - This article describes a new type of in situ ultrahigh‐vacuum compatible kelvin probe based on a voice‐coil driving mechanism. This design exhibits several advantages over conventional mechanical feed‐through and (in situ) piezoelectric devices in regard to the possibility of multiple probe geometry, flexibility of probe geometry, amplitude of oscillation, and pure parallel vibration. Automatic setup and constant spacing features are achieved using a digital‐to‐analog converter (DAC) steered offset potential. The combination of very low driver noise pick‐up and data‐acquisition system (DAS) signal processing techniques results in a work function (wf  ) resolution, under optimal conditions, of <0.1 meV. Due to its high surface sensitivity and compatibility with standard sample cleaning and analysis techniques this design has numerous applications in surface studies, e.g., adsorption kinetics, sample topography and homogeneity, sputter profiles, etc. For semiconductor specimens the high wf resolution makes it eminently suitable for surface photovoltage (SPV) spectroscopy.

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    Baikie ID, van der Werf K, Oerbekke H, Broeze J, van Silfhout A. Automatic kelvin probe compatible with ultrahigh vacuum. Review of scientific instruments. 1989;60(5):930. https://doi.org/10.1063/1.1140346