Abstract
| Original language | Undefined |
|---|---|
| Pages (from-to) | 930 |
| Journal | Review of scientific instruments |
| Volume | 60 |
| Issue number | 5 |
| DOIs | |
| Publication status | Published - 1989 |
Keywords
- IR-73182
Cite this
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Automatic kelvin probe compatible with ultrahigh vacuum. / Baikie, I.D.; van der Werf, Kees; Oerbekke, H.; Broeze, J.; van Silfhout, Arend.
In: Review of scientific instruments, Vol. 60, No. 5, 1989, p. 930.Research output: Contribution to journal › Article › Academic
TY - JOUR
T1 - Automatic kelvin probe compatible with ultrahigh vacuum
AU - Baikie, I.D.
AU - van der Werf, Kees
AU - Oerbekke, H.
AU - Broeze, J.
AU - van Silfhout, Arend
PY - 1989
Y1 - 1989
N2 - This article describes a new type of in situ ultrahigh‐vacuum compatible kelvin probe based on a voice‐coil driving mechanism. This design exhibits several advantages over conventional mechanical feed‐through and (in situ) piezoelectric devices in regard to the possibility of multiple probe geometry, flexibility of probe geometry, amplitude of oscillation, and pure parallel vibration. Automatic setup and constant spacing features are achieved using a digital‐to‐analog converter (DAC) steered offset potential. The combination of very low driver noise pick‐up and data‐acquisition system (DAS) signal processing techniques results in a work function (wf ) resolution, under optimal conditions, of <0.1 meV. Due to its high surface sensitivity and compatibility with standard sample cleaning and analysis techniques this design has numerous applications in surface studies, e.g., adsorption kinetics, sample topography and homogeneity, sputter profiles, etc. For semiconductor specimens the high wf resolution makes it eminently suitable for surface photovoltage (SPV) spectroscopy.
AB - This article describes a new type of in situ ultrahigh‐vacuum compatible kelvin probe based on a voice‐coil driving mechanism. This design exhibits several advantages over conventional mechanical feed‐through and (in situ) piezoelectric devices in regard to the possibility of multiple probe geometry, flexibility of probe geometry, amplitude of oscillation, and pure parallel vibration. Automatic setup and constant spacing features are achieved using a digital‐to‐analog converter (DAC) steered offset potential. The combination of very low driver noise pick‐up and data‐acquisition system (DAS) signal processing techniques results in a work function (wf ) resolution, under optimal conditions, of <0.1 meV. Due to its high surface sensitivity and compatibility with standard sample cleaning and analysis techniques this design has numerous applications in surface studies, e.g., adsorption kinetics, sample topography and homogeneity, sputter profiles, etc. For semiconductor specimens the high wf resolution makes it eminently suitable for surface photovoltage (SPV) spectroscopy.
KW - IR-73182
U2 - 10.1063/1.1140346
DO - 10.1063/1.1140346
M3 - Article
VL - 60
SP - 930
JO - Review of scientific instruments
JF - Review of scientific instruments
SN - 0034-6748
IS - 5
ER -