B4C/Si based EUV multilayer mirror with suppressed reflectivity for CO2 laser radiation

Viacheslav Medvedev, Andrey Yakshin, Robbert Wilhelmus Elisabeth van de Kruijs, V.M. Krivtsun, S.N. Yakunin, Frederik Bijkerk

Research output: Contribution to conferencePoster

Original languageEnglish
Pages-
Publication statusPublished - 13 Jun 2011
Event2011 International Workshop on EUV Lithography - Maui, United States
Duration: 13 Jun 201117 Jun 2011

Workshop

Workshop2011 International Workshop on EUV Lithography
CountryUnited States
CityMaui
Period13/06/1117/06/11

Keywords

  • METIS-277889

Cite this

Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Yakunin, S. N., & Bijkerk, F. (2011). B4C/Si based EUV multilayer mirror with suppressed reflectivity for CO2 laser radiation. -. Poster session presented at 2011 International Workshop on EUV Lithography, Maui, United States.