B4C/Si based EUV multilayer mirror with suppressed reflectivity for CO2 laser radiation

Viacheslav Medvedev, Andrey Yakshin, Robbert Wilhelmus Elisabeth van de Kruijs, V.M. Krivtsun, S.N. Yakunin, Frederik Bijkerk

Research output: Contribution to conferencePosterOther research output

Original languageEnglish
Pages-
Publication statusPublished - 13 Jun 2011
Event2011 International Workshop on EUV Lithography - Maui, United States
Duration: 13 Jun 201117 Jun 2011

Workshop

Workshop2011 International Workshop on EUV Lithography
CountryUnited States
CityMaui
Period13/06/1117/06/11

Keywords

  • METIS-277889

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