B4C/Si based EUV multilayer mirror with suppressed reflectivity for CO2 laser radiation

Viacheslav Medvedev, Andrey Yakshin, Robbert Wilhelmus Elisabeth van de Kruijs, V.M. Krivtsun, S.N. Yakunin, Frederik Bijkerk

Research output: Contribution to conferencePoster

Original languageEnglish
Pages-
Publication statusPublished - 13 Jun 2011
Event2011 International Workshop on EUV Lithography - Maui, United States
Duration: 13 Jun 201117 Jun 2011

Workshop

Workshop2011 International Workshop on EUV Lithography
CountryUnited States
CityMaui
Period13/06/1117/06/11

Keywords

  • METIS-277889

Cite this

Medvedev, V., Yakshin, A., van de Kruijs, R. W. E., Krivtsun, V. M., Yakunin, S. N., & Bijkerk, F. (2011). B4C/Si based EUV multilayer mirror with suppressed reflectivity for CO2 laser radiation. -. Poster session presented at 2011 International Workshop on EUV Lithography, Maui, United States.
Medvedev, Viacheslav ; Yakshin, Andrey ; van de Kruijs, Robbert Wilhelmus Elisabeth ; Krivtsun, V.M. ; Yakunin, S.N. ; Bijkerk, Frederik. / B4C/Si based EUV multilayer mirror with suppressed reflectivity for CO2 laser radiation. Poster session presented at 2011 International Workshop on EUV Lithography, Maui, United States.
@conference{86df13337ecd4697a33d327ebaf9b1d4,
title = "B4C/Si based EUV multilayer mirror with suppressed reflectivity for CO2 laser radiation",
keywords = "METIS-277889",
author = "Viacheslav Medvedev and Andrey Yakshin and {van de Kruijs}, {Robbert Wilhelmus Elisabeth} and V.M. Krivtsun and S.N. Yakunin and Frederik Bijkerk",
year = "2011",
month = "6",
day = "13",
language = "English",
pages = "--",
note = "2011 International Workshop on EUV Lithography ; Conference date: 13-06-2011 Through 17-06-2011",

}

Medvedev, V, Yakshin, A, van de Kruijs, RWE, Krivtsun, VM, Yakunin, SN & Bijkerk, F 2011, 'B4C/Si based EUV multilayer mirror with suppressed reflectivity for CO2 laser radiation' 2011 International Workshop on EUV Lithography, Maui, United States, 13/06/11 - 17/06/11, pp. -.

B4C/Si based EUV multilayer mirror with suppressed reflectivity for CO2 laser radiation. / Medvedev, Viacheslav; Yakshin, Andrey; van de Kruijs, Robbert Wilhelmus Elisabeth; Krivtsun, V.M.; Yakunin, S.N.; Bijkerk, Frederik.

2011. - Poster session presented at 2011 International Workshop on EUV Lithography, Maui, United States.

Research output: Contribution to conferencePoster

TY - CONF

T1 - B4C/Si based EUV multilayer mirror with suppressed reflectivity for CO2 laser radiation

AU - Medvedev, Viacheslav

AU - Yakshin, Andrey

AU - van de Kruijs, Robbert Wilhelmus Elisabeth

AU - Krivtsun, V.M.

AU - Yakunin, S.N.

AU - Bijkerk, Frederik

PY - 2011/6/13

Y1 - 2011/6/13

KW - METIS-277889

M3 - Poster

SP - -

ER -

Medvedev V, Yakshin A, van de Kruijs RWE, Krivtsun VM, Yakunin SN, Bijkerk F. B4C/Si based EUV multilayer mirror with suppressed reflectivity for CO2 laser radiation. 2011. Poster session presented at 2011 International Workshop on EUV Lithography, Maui, United States.