Basic elements for photodeposited high Tc thin film devices

J. Flokstra, R.P.J. IJsselsteijn, J.W.M. Hilgenkamp

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Abstract

Flat films, high quality insulating layers and adequately superconducting via contacts are basic elements for high Tc device fabrication. We studied the influence of the process parameters of laser deposition on the occurrence of droplets and outgrowths in YBaCuO films. The droplet density is minimal when a laser fluence below about 1.0 J cm-2 is used. The outgrowth density decreases with increasing laser pulse rate or decreasing deposition temperature. High quality flat films were obtained with a rate of 10 Hz and at a temperature of 720 °C. Wet chemical etching and etching with an Argon ion source were used for structuring multilayers with SrTiO3 as an insulating layer. Smooth edges were obtained with an argon gun. Bromine and EDTA etching are not adequate techniques for fabricating controllable well-defined edges. Cross-overs, via contacts and coils were prepared.
Original languageEnglish
Pages (from-to)304-309
Number of pages6
JournalThin solid films
Volume218
Issue number1-2
DOIs
Publication statusPublished - 1992

Fingerprint

Thin film devices
Argon
etching
Etching
thin films
argon
pulse rate
Bromine
laser deposition
Wet etching
Lasers
ethylenediaminetetraacetic acids
Ethylenediaminetetraacetic acid
Ion sources
bromine
Edetic Acid
ion sources
lasers
Laser pulses
Multilayers

Cite this

Flokstra, J. ; IJsselsteijn, R.P.J. ; Hilgenkamp, J.W.M. / Basic elements for photodeposited high Tc thin film devices. In: Thin solid films. 1992 ; Vol. 218, No. 1-2. pp. 304-309.
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Basic elements for photodeposited high Tc thin film devices. / Flokstra, J.; IJsselsteijn, R.P.J.; Hilgenkamp, J.W.M.

In: Thin solid films, Vol. 218, No. 1-2, 1992, p. 304-309.

Research output: Contribution to journalArticleAcademicpeer-review

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T1 - Basic elements for photodeposited high Tc thin film devices

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AU - IJsselsteijn, R.P.J.

AU - Hilgenkamp, J.W.M.

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AB - Flat films, high quality insulating layers and adequately superconducting via contacts are basic elements for high Tc device fabrication. We studied the influence of the process parameters of laser deposition on the occurrence of droplets and outgrowths in YBaCuO films. The droplet density is minimal when a laser fluence below about 1.0 J cm-2 is used. The outgrowth density decreases with increasing laser pulse rate or decreasing deposition temperature. High quality flat films were obtained with a rate of 10 Hz and at a temperature of 720 °C. Wet chemical etching and etching with an Argon ion source were used for structuring multilayers with SrTiO3 as an insulating layer. Smooth edges were obtained with an argon gun. Bromine and EDTA etching are not adequate techniques for fabricating controllable well-defined edges. Cross-overs, via contacts and coils were prepared.

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