Bi-epitaxial dc-SQUID patterning by Focussed Ion Beam Etching

R.P.J. IJsselsteijn, Johannes W.M. Hilgenkamp, Dick Veldhuis, Jakob Flokstra, Horst Rogalla

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationWorkshop on HTS Josephson Junctions and 3-Terminal Devices
    Place of PublicationUniversiteit Twente, Enschede
    Pages68-71
    Number of pages4
    Publication statusPublished - 15 Jun 1994

    Keywords

    • METIS-130129

    Cite this

    IJsselsteijn, R. P. J., Hilgenkamp, J. W. M., Veldhuis, D., Flokstra, J., & Rogalla, H. (1994). Bi-epitaxial dc-SQUID patterning by Focussed Ion Beam Etching. In Workshop on HTS Josephson Junctions and 3-Terminal Devices (pp. 68-71). Universiteit Twente, Enschede.
    IJsselsteijn, R.P.J. ; Hilgenkamp, Johannes W.M. ; Veldhuis, Dick ; Flokstra, Jakob ; Rogalla, Horst. / Bi-epitaxial dc-SQUID patterning by Focussed Ion Beam Etching. Workshop on HTS Josephson Junctions and 3-Terminal Devices. Universiteit Twente, Enschede, 1994. pp. 68-71
    @inproceedings{43ea9b7e58a34201b448261a2a29ba33,
    title = "Bi-epitaxial dc-SQUID patterning by Focussed Ion Beam Etching",
    keywords = "METIS-130129",
    author = "R.P.J. IJsselsteijn and Hilgenkamp, {Johannes W.M.} and Dick Veldhuis and Jakob Flokstra and Horst Rogalla",
    year = "1994",
    month = "6",
    day = "15",
    language = "Undefined",
    pages = "68--71",
    booktitle = "Workshop on HTS Josephson Junctions and 3-Terminal Devices",

    }

    IJsselsteijn, RPJ, Hilgenkamp, JWM, Veldhuis, D, Flokstra, J & Rogalla, H 1994, Bi-epitaxial dc-SQUID patterning by Focussed Ion Beam Etching. in Workshop on HTS Josephson Junctions and 3-Terminal Devices. Universiteit Twente, Enschede, pp. 68-71.

    Bi-epitaxial dc-SQUID patterning by Focussed Ion Beam Etching. / IJsselsteijn, R.P.J.; Hilgenkamp, Johannes W.M.; Veldhuis, Dick; Flokstra, Jakob; Rogalla, Horst.

    Workshop on HTS Josephson Junctions and 3-Terminal Devices. Universiteit Twente, Enschede, 1994. p. 68-71.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    TY - GEN

    T1 - Bi-epitaxial dc-SQUID patterning by Focussed Ion Beam Etching

    AU - IJsselsteijn, R.P.J.

    AU - Hilgenkamp, Johannes W.M.

    AU - Veldhuis, Dick

    AU - Flokstra, Jakob

    AU - Rogalla, Horst

    PY - 1994/6/15

    Y1 - 1994/6/15

    KW - METIS-130129

    M3 - Conference contribution

    SP - 68

    EP - 71

    BT - Workshop on HTS Josephson Junctions and 3-Terminal Devices

    CY - Universiteit Twente, Enschede

    ER -

    IJsselsteijn RPJ, Hilgenkamp JWM, Veldhuis D, Flokstra J, Rogalla H. Bi-epitaxial dc-SQUID patterning by Focussed Ion Beam Etching. In Workshop on HTS Josephson Junctions and 3-Terminal Devices. Universiteit Twente, Enschede. 1994. p. 68-71