Bi-epitaxial dc-SQUID patterning by Focussed Ion Beam Etching

R.P.J. IJsselsteijn, Johannes W.M. Hilgenkamp, Dick Veldhuis, Jakob Flokstra, Horst Rogalla

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationWorkshop on HTS Josephson Junctions and 3-Terminal Devices
    Place of PublicationUniversiteit Twente, Enschede
    Pages68-71
    Number of pages4
    Publication statusPublished - 15 Jun 1994

    Keywords

    • METIS-130129

    Cite this

    IJsselsteijn, R. P. J., Hilgenkamp, J. W. M., Veldhuis, D., Flokstra, J., & Rogalla, H. (1994). Bi-epitaxial dc-SQUID patterning by Focussed Ion Beam Etching. In Workshop on HTS Josephson Junctions and 3-Terminal Devices (pp. 68-71). Universiteit Twente, Enschede.