Black silicon method X: a review on high speed and selective plasma etching of silicon with profile control: an in-depth comparison between Bosch and cryostat DRIE processes as a roadmap to next generation equipment

Henricus V. Jansen, Meint J. de Boer, S. Unnikrishnan, M.C. Louwerse, Michael Curt Elwenspoek

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    Abstract

    An intensive study has been performed to understand and tune deep reactive ion etch (DRIE) processes for optimum results with respect to the silicon etch rate, etch profile and mask etch selectivity (in order of priority) using state-of-the-art dual power source DRIE equipment. The research compares pulsed-mode DRIE processes (e.g. Bosch technique) and mixed-mode DRIE processes (e.g. cryostat technique). In both techniques, an inhibitor is added to fluorine-based plasma to achieve directional etching, which is formed out of an oxide-forming (O2) or a fluorocarbon (FC) gas (C4F8 or CHF3). The inhibitor can be introduced together with the etch gas, which is named a mixed-mode DRIE process, or the inhibitor can be added in a time-multiplexed manner, which will be termed a pulsed-mode DRIE process. Next, the most convenient mode of operation found in this study is highlighted including some remarks to ensure proper etching (i.e. step synchronization in pulsed-mode operation and heat control of the wafer). First of all, for the fabrication ...... Enjoy reading . Henri Jansen 18 June 2008
    Original languageUndefined
    Article number10.1088/0960-1317/19/3/033001
    Pages (from-to)033001
    Number of pages41
    JournalJournal of micromechanics and microengineering
    Volume19
    Issue number3
    DOIs
    Publication statusPublished - Jan 2009

    Keywords

    • EWI-15196
    • IR-62773
    • METIS-263769

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