Blistering behavior in Mo/Si multilayers

A.S. Kuznetsov, M.A. Gleeson, R.W.E. van de Kruijs, F. Bijkerk

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

4 Citations (Scopus)

Abstract

This paper is concerned with mapping the characteristics of blistering induced on Mo/Si multilayers as a result of irradiation by hydrogen species generated in a thermal capillary cracker. The nature and extent of the damage observed is dependent on exposure conditions such as the sample temperature, the hydrogen isotope used and the total fluence. Increasing the sample temperature leads to fewer but larger blisters. When D2 is used as the working gas, blisters are ~5 times smaller in diameter than in the case of H2 exposure, but more blisters are formed. Increasing the gas flow induces more and bigger blisters andblisters were observed to develop in two distinct size distributions.
Original languageEnglish
Title of host publicationSPIE Optics + Optoelectronics 2011
EditorsA.S. Kuznetsov
PublisherSPIE
Number of pages6
DOIs
Publication statusPublished - 18 Apr 2011
EventSPIE Optics + Optoelectronics 2011 - Prague Congress Centre, Prague, Czech Republic
Duration: 18 Apr 201120 Apr 2011
https://spie.org/conferences-and-exhibitions/past-conferences-and-exhibitions/optics-and-optoelectronics-2011

Publication series

NameProceedings of SPIE
PublisherSPIE
Volume8077
ISSN (Print)0277-786X

Conference

ConferenceSPIE Optics + Optoelectronics 2011
CountryCzech Republic
CityPrague
Period18/04/1120/04/11
Internet address

Keywords

  • METIS-283336

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  • Cite this

    Kuznetsov, A. S., Gleeson, M. A., van de Kruijs, R. W. E., & Bijkerk, F. (2011). Blistering behavior in Mo/Si multilayers. In A. S. Kuznetsov (Ed.), SPIE Optics + Optoelectronics 2011 [807713] (Proceedings of SPIE; Vol. 8077). SPIE. https://doi.org/10.1117/12.887326