Bragg gratings in Al2O3 channel waveguides by focused ion beam milling

F. Ay, J. Bradley, R.M. de Ridder, Markus Pollnau

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review


    We report on utilization and optimization of the focused ion beam technique for fabrication of nano-structures on $Al_2O_3$ channel waveguides for applications in integrated photonic devices. In particular, investigation of the effects of parameters such as ion beam current, dwell time, scanning strategy, and dielectric charging effects are addressed. As a result of optimization of these parameters, excellent quality gratings with smooth and uniform sidewalls are reported. The effects of Ga ion implantation during the milling process on the optical performance of the devices are discussed.
    Original languageUndefined
    Title of host publicationProceedings of the 13th Annual Symposium of the IEEE LEOS Benelux Chapter
    EditorsKerstin Worhoff, L. Agazzi, N. Ismail, X Leijtens
    Place of PublicationEnschede, The Netherlands
    Number of pages2
    ISBN (Print)978-90-365-2768-2
    Publication statusPublished - 27 Nov 2008
    Event13th Annual Symposium of the IEEE/LEOS Benelux Chapter 2008 - Enschede, Netherlands
    Duration: 27 Nov 200828 Nov 2008
    Conference number: 13

    Publication series

    PublisherIEEE Benelux Photonics Society


    Conference13th Annual Symposium of the IEEE/LEOS Benelux Chapter 2008


    • IOMS-APD: Active Photonic Devices
    • EWI-14850
    • METIS-255106
    • IR-62685
    • EC Grant Agreement nr.: FP6/017501

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