Bragg gratings in Al2O3 channel waveguides by focused ion beam milling

F. Ay; J. Bradley; R.M. de Ridder; Markus Pollnau

Bragg gratings in Al₂O₃ channel waveguides by focused ion beam milling

F. Ay, J. Bradley, R.M. de Ridder, Markus Pollnau

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

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Abstract

We report on utilization and optimization of the focused ion beam technique for fabrication of nano-structures on $Al_2O_3$ channel waveguides for applications in integrated photonic devices. In particular, investigation of the effects of parameters such as ion beam current, dwell time, scanning strategy, and dielectric charging effects are addressed. As a result of optimization of these parameters, excellent quality gratings with smooth and uniform sidewalls are reported. The effects of Ga ion implantation during the milling process on the optical performance of the devices are discussed.

Original language	Undefined
Title of host publication	Proceedings of the 13th Annual Symposium of the IEEE LEOS Benelux Chapter
Editors	Kerstin Worhoff, L. Agazzi, N. Ismail, X Leijtens
Place of Publication	Enschede, The Netherlands
Publisher	IEEE
Pages	215-217
Number of pages	2
ISBN (Print)	978-90-365-2768-2
Publication status	Published - 27 Nov 2008
Event	13th Annual Symposium of the IEEE/LEOS Benelux Chapter 2008 - Enschede, Netherlands Duration: 27 Nov 2008 → 28 Nov 2008 Conference number: 13

Publication series

Name
Publisher	IEEE Benelux Photonics Society
Number	2008/16200

Conference

Conference	13th Annual Symposium of the IEEE/LEOS Benelux Chapter 2008
Country/Territory	Netherlands
City	Enschede
Period	27/11/08 → 28/11/08

Keywords

IOMS-APD: Active Photonic Devices
EWI-14850
METIS-255106
IR-62685
EC Grant Agreement nr.: FP6/017501

Cite this

@inproceedings{e87aac4a7827444d8e0402f8b2af8680,

title = "Bragg gratings in Al2O3 channel waveguides by focused ion beam milling",

abstract = "We report on utilization and optimization of the focused ion beam technique for fabrication of nano-structures on $Al_2O_3$ channel waveguides for applications in integrated photonic devices. In particular, investigation of the effects of parameters such as ion beam current, dwell time, scanning strategy, and dielectric charging effects are addressed. As a result of optimization of these parameters, excellent quality gratings with smooth and uniform sidewalls are reported. The effects of Ga ion implantation during the milling process on the optical performance of the devices are discussed.",

keywords = "IOMS-APD: Active Photonic Devices, EWI-14850, METIS-255106, IR-62685, EC Grant Agreement nr.: FP6/017501",

author = "F. Ay and J. Bradley and {de Ridder}, R.M. and Markus Pollnau",

year = "2008",

month = nov,

day = "27",

language = "Undefined",

isbn = "978-90-365-2768-2",

publisher = "IEEE",

number = "2008/16200",

pages = "215--217",

editor = "Kerstin Worhoff and L. Agazzi and N. Ismail and X Leijtens",

booktitle = "Proceedings of the 13th Annual Symposium of the IEEE LEOS Benelux Chapter",

address = "United States",

note = "13th Annual Symposium of the IEEE/LEOS Benelux Chapter 2008 ; Conference date: 27-11-2008 Through 28-11-2008",

}

Ay, F, Bradley, J, de Ridder, RM & Pollnau, M 2008, Bragg gratings in Al₂O₃ channel waveguides by focused ion beam milling. in K Worhoff, L Agazzi, N Ismail & X Leijtens (eds), Proceedings of the 13th Annual Symposium of the IEEE LEOS Benelux Chapter. IEEE, Enschede, The Netherlands, pp. 215-217, 13th Annual Symposium of the IEEE/LEOS Benelux Chapter 2008, Enschede, Netherlands, 27/11/08.

Bragg gratings in Al₂O₃ channel waveguides by focused ion beam milling. / Ay, F.; Bradley, J.; de Ridder, R.M. et al.
Proceedings of the 13th Annual Symposium of the IEEE LEOS Benelux Chapter. ed. / Kerstin Worhoff; L. Agazzi; N. Ismail; X Leijtens. Enschede, The Netherlands: IEEE, 2008. p. 215-217.

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution › Academic › peer-review

TY - GEN

T1 - Bragg gratings in Al2O3 channel waveguides by focused ion beam milling

AU - Ay, F.

AU - Bradley, J.

AU - de Ridder, R.M.

AU - Pollnau, Markus

N1 - Conference code: 13

PY - 2008/11/27

Y1 - 2008/11/27

N2 - We report on utilization and optimization of the focused ion beam technique for fabrication of nano-structures on $Al_2O_3$ channel waveguides for applications in integrated photonic devices. In particular, investigation of the effects of parameters such as ion beam current, dwell time, scanning strategy, and dielectric charging effects are addressed. As a result of optimization of these parameters, excellent quality gratings with smooth and uniform sidewalls are reported. The effects of Ga ion implantation during the milling process on the optical performance of the devices are discussed.

AB - We report on utilization and optimization of the focused ion beam technique for fabrication of nano-structures on $Al_2O_3$ channel waveguides for applications in integrated photonic devices. In particular, investigation of the effects of parameters such as ion beam current, dwell time, scanning strategy, and dielectric charging effects are addressed. As a result of optimization of these parameters, excellent quality gratings with smooth and uniform sidewalls are reported. The effects of Ga ion implantation during the milling process on the optical performance of the devices are discussed.

KW - IOMS-APD: Active Photonic Devices

KW - EWI-14850

KW - METIS-255106

KW - IR-62685

KW - EC Grant Agreement nr.: FP6/017501

M3 - Conference contribution

SN - 978-90-365-2768-2

SP - 215

EP - 217

BT - Proceedings of the 13th Annual Symposium of the IEEE LEOS Benelux Chapter

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A2 - Agazzi, L.

A2 - Ismail, N.

A2 - Leijtens, X

PB - IEEE

CY - Enschede, The Netherlands

T2 - 13th Annual Symposium of the IEEE/LEOS Benelux Chapter 2008

Y2 - 27 November 2008 through 28 November 2008

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