Buried injector logic, a vertical IIL using deep ion implantation

A.J. Mouthaan

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    Abstract

    A vertically integrated alternative for integrated injection logic has been realized, named buried injector logic (BIL). 1 MeV ion implantations are used to create buried layers. The vertical pnp and npn transistors have thin base regions and exhibit a limited charge accumulation if a gate is saturated. d.c. and dynamic analysis of BIL-gate behaviour are given. A minimum gate delay of well below 1 ns is projected if collector areas are smaller than 10 μm2 within an oxide isolated structure. A relation between maximum injector current density and device size is derived.
    Original languageUndefined
    Pages (from-to)1243-1249
    JournalSolid-state electronics
    Volume30
    Issue number12
    DOIs
    Publication statusPublished - 1987

    Keywords

    • IR-69853

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