C-axis oriented growth of magnetron sputtered YBaCuO thin films on MgO substrates

B. Häuser; E.G. Keim; H. Rogalla; A. van Silfhout

doi:10.1007/BF01210356

C-axis oriented growth of magnetron sputtered YBaCuO thin films on MgO substrates

B. Häuser, E.G. Keim, H. Rogalla, A. van Silfhout

Faculty of Science and Technology

Research output: Contribution to journal › Article › Academic

2 Citations (Scopus)

158 Downloads (Pure)

Abstract

Highly textured YBaCuO thin films were sputtered on MgO (100)-oriented single crystal substrates at ambient temperature followed by an anneal in oxygen for 1 h at temperatures up to 920 C. X-ray diffractograms of the highly textured films indicate an orientation of the c-axis of the YBaCuO lattice perpendicular to the substrate surface. There are strong indications that the oriented c-axis growth is due to a CuO self-flux effect. Auger measurements reveal a copper diffusion profile into the substrate down to a depth of more than 400 nm.

Original language	English
Pages (from-to)	339-341
Journal	Applied physics A: Materials science and processing
Volume	46
Issue number	4
DOIs	https://doi.org/10.1007/BF01210356
Publication status	Published - 1988

Access to Document

10.1007/BF01210356

Hauser1988c-axisFinal published version, 541 KB

Cite this

@article{04fa3fe083014f9c87e8f559e777ad17,

title = "C-axis oriented growth of magnetron sputtered YBaCuO thin films on MgO substrates",

abstract = "Highly textured YBaCuO thin films were sputtered on MgO (100)-oriented single crystal substrates at ambient temperature followed by an anneal in oxygen for 1 h at temperatures up to 920 C. X-ray diffractograms of the highly textured films indicate an orientation of the c-axis of the YBaCuO lattice perpendicular to the substrate surface. There are strong indications that the oriented c-axis growth is due to a CuO self-flux effect. Auger measurements reveal a copper diffusion profile into the substrate down to a depth of more than 400 nm.",

author = "B. H{\"a}user and E.G. Keim and H. Rogalla and {van Silfhout}, A.",

year = "1988",

doi = "10.1007/BF01210356",

language = "English",

volume = "46",

pages = "339--341",

journal = "Applied physics A: Materials science and processing",

issn = "0947-8396",

publisher = "Springer",

number = "4",

}

TY - JOUR

T1 - C-axis oriented growth of magnetron sputtered YBaCuO thin films on MgO substrates

AU - Häuser, B.

AU - Keim, E.G.

AU - Rogalla, H.

AU - van Silfhout, A.

PY - 1988

Y1 - 1988

N2 - Highly textured YBaCuO thin films were sputtered on MgO (100)-oriented single crystal substrates at ambient temperature followed by an anneal in oxygen for 1 h at temperatures up to 920 C. X-ray diffractograms of the highly textured films indicate an orientation of the c-axis of the YBaCuO lattice perpendicular to the substrate surface. There are strong indications that the oriented c-axis growth is due to a CuO self-flux effect. Auger measurements reveal a copper diffusion profile into the substrate down to a depth of more than 400 nm.

AB - Highly textured YBaCuO thin films were sputtered on MgO (100)-oriented single crystal substrates at ambient temperature followed by an anneal in oxygen for 1 h at temperatures up to 920 C. X-ray diffractograms of the highly textured films indicate an orientation of the c-axis of the YBaCuO lattice perpendicular to the substrate surface. There are strong indications that the oriented c-axis growth is due to a CuO self-flux effect. Auger measurements reveal a copper diffusion profile into the substrate down to a depth of more than 400 nm.

U2 - 10.1007/BF01210356

DO - 10.1007/BF01210356

M3 - Article

SN - 0947-8396

VL - 46

SP - 339

EP - 341

JO - Applied physics A: Materials science and processing

JF - Applied physics A: Materials science and processing

IS - 4

ER -

C-axis oriented growth of magnetron sputtered YBaCuO thin films on MgO substrates

Abstract

Access to Document

Fingerprint

Cite this