Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas

G.M. Wright, R.S. Al, E. Alves, L.C. Alves, N.P. Barradas, A.W. Kleyn, N.J.L. Cardozo, H.J. van der Meiden, V. Philipps, G.J. Rooij, A.E. Shumack, W.A.J. Vijvers, J. Westerhout, E. Zoethout, J. Rapp

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    Abstract

    Tungsten (W) targets have been exposed to high density (n(e) <= 4 x 10(19) m(-3)), low temperature (T-e <= 3 eV) CH4-seeded deuterium (D) plasma in Pilot-PSI. The surface temperature of the target was similar to 1220 K at the center and decreased radially to similar to 650 K at the edges. Carbon film growth was found to only occur in regions where there was a clear CII emission line, corresponding to regions in the plasma with T-e >= 2 eV. The maximum film thickness was similar to 2.1 mu m after a plasma exposure time of 120 S. He-3 nuclear reaction (NRA) analysis and thermal desorption spectroscopy (TDS) determine that the presence of a thin carbon film dominates the hydrogenic retention properties of the W substrate. Thermal desorption spectroscopy analysis shows retention increasing roughly linearly with incident plasma fluence. NRA measures a C/D ratio of similar to 0.002 in these films deposited at high surface temperatures. (C) 2009 Elsevier B.V. All rights reserved.
    Original languageEnglish
    Pages (from-to)176-180
    JournalJournal of nuclear materials
    Volume396
    Issue number2-3
    DOIs
    Publication statusPublished - 2010

    Keywords

    • METIS-316789

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    Wright, G. M., Al, R. S., Alves, E., Alves, L. C., Barradas, N. P., Kleyn, A. W., ... Rapp, J. (2010). Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas. Journal of nuclear materials, 396(2-3), 176-180. https://doi.org/10.1016/j.jnucmat.2009.11.002