Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas

G.M. Wright; R.S. Al; E. Alves; L.C. Alves; N.P. Barradas; A.W. Kleyn; N.J.L. Cardozo; H.J. van der Meiden; V. Philipps; G.J. Rooij; A.E. Shumack; W.A.J. Vijvers; J. Westerhout; E. Zoethout; J. Rapp

doi:10.1016/j.jnucmat.2009.11.002

Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas

G.M. Wright, R.S. Al, E. Alves, L.C. Alves, N.P. Barradas, A.W. Kleyn, N.J.L. Cardozo, H.J. van der Meiden, V. Philipps, G.J. Rooij, A.E. Shumack, W.A.J. Vijvers, J. Westerhout, E. Zoethout, J. Rapp

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Abstract

Tungsten (W) targets have been exposed to high density (n(e) <= 4 x 10(19) m(-3)), low temperature (T-e <= 3 eV) CH4-seeded deuterium (D) plasma in Pilot-PSI. The surface temperature of the target was similar to 1220 K at the center and decreased radially to similar to 650 K at the edges. Carbon film growth was found to only occur in regions where there was a clear CII emission line, corresponding to regions in the plasma with T-e >= 2 eV. The maximum film thickness was similar to 2.1 mu m after a plasma exposure time of 120 S. He-3 nuclear reaction (NRA) analysis and thermal desorption spectroscopy (TDS) determine that the presence of a thin carbon film dominates the hydrogenic retention properties of the W substrate. Thermal desorption spectroscopy analysis shows retention increasing roughly linearly with incident plasma fluence. NRA measures a C/D ratio of similar to 0.002 in these films deposited at high surface temperatures. (C) 2009 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	176-180
Journal	Journal of nuclear materials
Volume	396
Issue number	2-3
DOIs	https://doi.org/10.1016/j.jnucmat.2009.11.002
Publication status	Published - 2010

Keywords

METIS-316789

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10.1016/j.jnucmat.2009.11.002

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Wright, G. M., Al, R. S., Alves, E., Alves, L. C., Barradas, N. P., Kleyn, A. W., Cardozo, N. J. L., van der Meiden, H. J., Philipps, V., Rooij, G. J., Shumack, A. E., Vijvers, W. A. J., Westerhout, J., Zoethout, E., & Rapp, J. (2010). Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas. Journal of nuclear materials, 396(2-3), 176-180. https://doi.org/10.1016/j.jnucmat.2009.11.002

@article{d08faeede85a4ef1a08d9be815fcee73,

title = "Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas",

abstract = "Tungsten (W) targets have been exposed to high density (n(e) <= 4 x 10(19) m(-3)), low temperature (T-e <= 3 eV) CH4-seeded deuterium (D) plasma in Pilot-PSI. The surface temperature of the target was similar to 1220 K at the center and decreased radially to similar to 650 K at the edges. Carbon film growth was found to only occur in regions where there was a clear CII emission line, corresponding to regions in the plasma with T-e >= 2 eV. The maximum film thickness was similar to 2.1 mu m after a plasma exposure time of 120 S. He-3 nuclear reaction (NRA) analysis and thermal desorption spectroscopy (TDS) determine that the presence of a thin carbon film dominates the hydrogenic retention properties of the W substrate. Thermal desorption spectroscopy analysis shows retention increasing roughly linearly with incident plasma fluence. NRA measures a C/D ratio of similar to 0.002 in these films deposited at high surface temperatures. (C) 2009 Elsevier B.V. All rights reserved.",

keywords = "METIS-316789",

author = "G.M. Wright and R.S. Al and E. Alves and L.C. Alves and N.P. Barradas and A.W. Kleyn and N.J.L. Cardozo and {van der Meiden}, H.J. and V. Philipps and G.J. Rooij and A.E. Shumack and W.A.J. Vijvers and J. Westerhout and E. Zoethout and J. Rapp",

year = "2010",

doi = "10.1016/j.jnucmat.2009.11.002",

language = "English",

volume = "396",

pages = "176--180",

journal = "Journal of nuclear materials",

issn = "0022-3115",

publisher = "Elsevier B.V.",

number = "2-3",

}

Wright, GM, Al, RS, Alves, E, Alves, LC, Barradas, NP, Kleyn, AW, Cardozo, NJL, van der Meiden, HJ, Philipps, V, Rooij, GJ, Shumack, AE, Vijvers, WAJ, Westerhout, J, Zoethout, E & Rapp, J 2010, 'Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas', Journal of nuclear materials, vol. 396, no. 2-3, pp. 176-180. https://doi.org/10.1016/j.jnucmat.2009.11.002

TY - JOUR

T1 - Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas

AU - Wright, G.M.

AU - Al, R.S.

AU - Alves, E.

AU - Alves, L.C.

AU - Barradas, N.P.

AU - Kleyn, A.W.

AU - Cardozo, N.J.L.

AU - van der Meiden, H.J.

AU - Philipps, V.

AU - Rooij, G.J.

AU - Shumack, A.E.

AU - Vijvers, W.A.J.

AU - Westerhout, J.

AU - Zoethout, E.

AU - Rapp, J.

PY - 2010

Y1 - 2010

N2 - Tungsten (W) targets have been exposed to high density (n(e) <= 4 x 10(19) m(-3)), low temperature (T-e <= 3 eV) CH4-seeded deuterium (D) plasma in Pilot-PSI. The surface temperature of the target was similar to 1220 K at the center and decreased radially to similar to 650 K at the edges. Carbon film growth was found to only occur in regions where there was a clear CII emission line, corresponding to regions in the plasma with T-e >= 2 eV. The maximum film thickness was similar to 2.1 mu m after a plasma exposure time of 120 S. He-3 nuclear reaction (NRA) analysis and thermal desorption spectroscopy (TDS) determine that the presence of a thin carbon film dominates the hydrogenic retention properties of the W substrate. Thermal desorption spectroscopy analysis shows retention increasing roughly linearly with incident plasma fluence. NRA measures a C/D ratio of similar to 0.002 in these films deposited at high surface temperatures. (C) 2009 Elsevier B.V. All rights reserved.

AB - Tungsten (W) targets have been exposed to high density (n(e) <= 4 x 10(19) m(-3)), low temperature (T-e <= 3 eV) CH4-seeded deuterium (D) plasma in Pilot-PSI. The surface temperature of the target was similar to 1220 K at the center and decreased radially to similar to 650 K at the edges. Carbon film growth was found to only occur in regions where there was a clear CII emission line, corresponding to regions in the plasma with T-e >= 2 eV. The maximum film thickness was similar to 2.1 mu m after a plasma exposure time of 120 S. He-3 nuclear reaction (NRA) analysis and thermal desorption spectroscopy (TDS) determine that the presence of a thin carbon film dominates the hydrogenic retention properties of the W substrate. Thermal desorption spectroscopy analysis shows retention increasing roughly linearly with incident plasma fluence. NRA measures a C/D ratio of similar to 0.002 in these films deposited at high surface temperatures. (C) 2009 Elsevier B.V. All rights reserved.

KW - METIS-316789

U2 - 10.1016/j.jnucmat.2009.11.002

DO - 10.1016/j.jnucmat.2009.11.002

M3 - Article

SN - 0022-3115

VL - 396

SP - 176

EP - 180

JO - Journal of nuclear materials

JF - Journal of nuclear materials

IS - 2-3

ER -

Carbon film growth and hydrogenic retention of tungsten exposed to carbon-seeded high density deuterium plasmas

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Keywords

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