"Change of the surface induced optical anisotropy of the clean Si(110) surface by oxidation"

Herbert Wormeester; A.M. Molenbroek; Christianus M.J. Wijers; Arend van Silfhout

doi:10.1016/0039-6028(92)90015-X

"Change of the surface induced optical anisotropy of the clean Si(110) surface by oxidation"

Herbert Wormeester, A.M. Molenbroek, Christianus M.J. Wijers, Arend van Silfhout

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Abstract

Normal incidence ellipsometry has been used to measure the change in the complex anisotropic reflectance ratio ¿ upon oxidation of the clean Si(110)16 × 2 surface. The spectroscopic change in the amplitude of ¿ (tan(¿)) shows a broad maximum of height 1.4 × 10¿3 in the high energy region above 2.5 eV. No phase shift difference for the reflectance coefficients belonging to the surface principal optical axes has been measured. A Kramers-Kronig transformation of the amplitude ratio showed that a change in the phase is not expected. The change in tan(¿) indicates that the change in reflection upon oxidation in the optical region ismainly in the (10) direction.

Original language	Undefined
Pages (from-to)	31-36
Number of pages	6
Journal	Surface science
Volume	260
Issue number	1-3
DOIs	https://doi.org/10.1016/0039-6028(92)90015-X
Publication status	Published - 1992

Keywords

METIS-128868
IR-24069

Access to Document

10.1016/0039-6028(92)90015-X

Wormeester92change

Cite this

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title = "{"}Change of the surface induced optical anisotropy of the clean Si(110) surface by oxidation{"}",

abstract = "Normal incidence ellipsometry has been used to measure the change in the complex anisotropic reflectance ratio ¿ upon oxidation of the clean Si(110)16 × 2 surface. The spectroscopic change in the amplitude of ¿ (tan(¿)) shows a broad maximum of height 1.4 × 10¿3 in the high energy region above 2.5 eV. No phase shift difference for the reflectance coefficients belonging to the surface principal optical axes has been measured. A Kramers-Kronig transformation of the amplitude ratio showed that a change in the phase is not expected. The change in tan(¿) indicates that the change in reflection upon oxidation in the optical region ismainly in the (10) direction.",

keywords = "METIS-128868, IR-24069",

author = "Herbert Wormeester and A.M. Molenbroek and Wijers, {Christianus M.J.} and {van Silfhout}, Arend",

year = "1992",

doi = "10.1016/0039-6028(92)90015-X",

language = "Undefined",

volume = "260",

pages = "31--36",

journal = "Surface science",

issn = "0039-6028",

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TY - JOUR

T1 - "Change of the surface induced optical anisotropy of the clean Si(110) surface by oxidation"

AU - Wormeester, Herbert

AU - Molenbroek, A.M.

AU - Wijers, Christianus M.J.

AU - van Silfhout, Arend

PY - 1992

Y1 - 1992

N2 - Normal incidence ellipsometry has been used to measure the change in the complex anisotropic reflectance ratio ¿ upon oxidation of the clean Si(110)16 × 2 surface. The spectroscopic change in the amplitude of ¿ (tan(¿)) shows a broad maximum of height 1.4 × 10¿3 in the high energy region above 2.5 eV. No phase shift difference for the reflectance coefficients belonging to the surface principal optical axes has been measured. A Kramers-Kronig transformation of the amplitude ratio showed that a change in the phase is not expected. The change in tan(¿) indicates that the change in reflection upon oxidation in the optical region ismainly in the (10) direction.

AB - Normal incidence ellipsometry has been used to measure the change in the complex anisotropic reflectance ratio ¿ upon oxidation of the clean Si(110)16 × 2 surface. The spectroscopic change in the amplitude of ¿ (tan(¿)) shows a broad maximum of height 1.4 × 10¿3 in the high energy region above 2.5 eV. No phase shift difference for the reflectance coefficients belonging to the surface principal optical axes has been measured. A Kramers-Kronig transformation of the amplitude ratio showed that a change in the phase is not expected. The change in tan(¿) indicates that the change in reflection upon oxidation in the optical region ismainly in the (10) direction.

KW - METIS-128868

KW - IR-24069

U2 - 10.1016/0039-6028(92)90015-X

DO - 10.1016/0039-6028(92)90015-X

M3 - Article

SN - 0039-6028

VL - 260

SP - 31

EP - 36

JO - Surface science

JF - Surface science

IS - 1-3

ER -