Channel profile engineering of 0.1 μm-Si MOSFETs by through-the-gate implantation

Y.V. Ponomarev, P.A. Stolk, A.C.M.C. van Brandenburg, R. Roes, A.H. Montree, J. Schmitz, P.H. Woerlee

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

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    Physics & Astronomy

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    Engineering & Materials Science