Characterisation of low-stress LPCVD silicon nitride in high frequency BJT's with self-aligned metallization

H. W. van Zeijl*, L. K. Nanver

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

3 Citations (Scopus)

Fingerprint

Dive into the research topics of 'Characterisation of low-stress LPCVD silicon nitride in high frequency BJT's with self-aligned metallization'. Together they form a unique fingerprint.

Engineering

Chemistry

Material Science

Physics