Characterisation of Silicon Oxide films deposited by means of ECR PECVD

Alexeij Y. Kovalgin, I.G. Isai, J. Holleman, R. Dekker, P.H. Woerlee, Hans Wallinga

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationSAFE'99
    Place of PublicationMierlo, The Netherlands
    Pages239-246
    Number of pages8
    Publication statusPublished - 24 Nov 1999

    Keywords

    • METIS-113898

    Cite this

    Kovalgin, A. Y., Isai, I. G., Holleman, J., Dekker, R., Woerlee, P. H., & Wallinga, H. (1999). Characterisation of Silicon Oxide films deposited by means of ECR PECVD. In SAFE'99 (pp. 239-246). Mierlo, The Netherlands.
    Kovalgin, Alexeij Y. ; Isai, I.G. ; Holleman, J. ; Dekker, R. ; Woerlee, P.H. ; Wallinga, Hans. / Characterisation of Silicon Oxide films deposited by means of ECR PECVD. SAFE'99. Mierlo, The Netherlands, 1999. pp. 239-246
    @inproceedings{b905da0173234ac8bdbb8a659735617e,
    title = "Characterisation of Silicon Oxide films deposited by means of ECR PECVD",
    keywords = "METIS-113898",
    author = "Kovalgin, {Alexeij Y.} and I.G. Isai and J. Holleman and R. Dekker and P.H. Woerlee and Hans Wallinga",
    year = "1999",
    month = "11",
    day = "24",
    language = "Undefined",
    isbn = "90-73461-18-9",
    pages = "239--246",
    booktitle = "SAFE'99",

    }

    Kovalgin, AY, Isai, IG, Holleman, J, Dekker, R, Woerlee, PH & Wallinga, H 1999, Characterisation of Silicon Oxide films deposited by means of ECR PECVD. in SAFE'99. Mierlo, The Netherlands, pp. 239-246.

    Characterisation of Silicon Oxide films deposited by means of ECR PECVD. / Kovalgin, Alexeij Y.; Isai, I.G.; Holleman, J.; Dekker, R.; Woerlee, P.H.; Wallinga, Hans.

    SAFE'99. Mierlo, The Netherlands, 1999. p. 239-246.

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    TY - GEN

    T1 - Characterisation of Silicon Oxide films deposited by means of ECR PECVD

    AU - Kovalgin, Alexeij Y.

    AU - Isai, I.G.

    AU - Holleman, J.

    AU - Dekker, R.

    AU - Woerlee, P.H.

    AU - Wallinga, Hans

    PY - 1999/11/24

    Y1 - 1999/11/24

    KW - METIS-113898

    M3 - Conference contribution

    SN - 90-73461-18-9

    SP - 239

    EP - 246

    BT - SAFE'99

    CY - Mierlo, The Netherlands

    ER -

    Kovalgin AY, Isai IG, Holleman J, Dekker R, Woerlee PH, Wallinga H. Characterisation of Silicon Oxide films deposited by means of ECR PECVD. In SAFE'99. Mierlo, The Netherlands. 1999. p. 239-246