Characterisation of Silicon Oxide films deposited by means of ECR PECVD

Alexeij Y. Kovalgin, I.G. Isai, J. Holleman, R. Dekker, P.H. Woerlee, Hans Wallinga

    Research output: Chapter in Book/Report/Conference proceedingConference contributionAcademicpeer-review

    Original languageUndefined
    Title of host publicationSAFE'99
    Place of PublicationMierlo, The Netherlands
    Number of pages8
    Publication statusPublished - 24 Nov 1999


    • METIS-113898

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